Location History:
- Hyogo, JP (2013 - 2019)
- Amagasaki, JP (2010 - 2020)
Company Filing History:
6 out of 15 
2 out of 129 
2 out of 144 Years Active: 2010-2020
Title: The Innovations of Shoichi Murakami
Introduction
Shoichi Murakami is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon nitride films. With a total of nine patents to his name, Murakami's work has advanced the understanding and application of silicon nitride in various industries.
Latest Patents
Murakami's latest patents include a method for producing silicon nitride film and the silicon nitride film itself. One of the key objectives of his invention is to provide a method for producing a silicon nitride film that exhibits high resistance to hydrofluoric acid and moisture, while maintaining appropriate internal stress on a substrate controlled at temperatures of 250°C or lower. This method utilizes a plasma chemical vapor deposition technique, incorporating a processing gas that combines a hydrogen reducing gas with an organosilane gas. The process is conducted under specific pressure and high-frequency electric power conditions to optimize the film's properties. Additionally, he has developed a method to reduce the carbon and hydrogen atom content in silicon nitride films formed by plasma CVD, thereby improving their electrical properties and overall quality.
Career Highlights
Throughout his career, Murakami has worked with prominent companies such as SPP Technologies Co., Ltd. and Sumitomo Precision Products Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and contribute to innovative solutions in the industry.
Collaborations
Murakami has collaborated with notable colleagues, including Masayasu Hatashita and Akimitsu Oishi. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Shoichi Murakami's contributions to the field of silicon nitride film production highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to improving the quality and performance of silicon nitride films, making a lasting impact in the industry.