Location History:
- Tsukuba, JP (2014)
- Kai, JP (2020)
- Tokyo, JP (2019 - 2024)
Company Filing History:
Years Active: 2014-2024
Title: Masaya Yamawaki: Innovator in Gas Separation and Silicon Nitride Film Production
Introduction
Masaya Yamawaki is a notable inventor based in Kai, Japan, recognized for his contributions to gas separation methods and silicon nitride film production. With a total of four patents to his name, he has made significant advancements in these fields.
Latest Patents
Yamawaki's latest patents include a gas separation method and a gas separation device. The gas separation method involves introducing a rare gas as the first introduced gas and an impurity gas as the second introduced gas into a raw material gas. The flow rates of both gases are meticulously controlled based on the flow rates of the gases in the discharged output from a rare gas using facility. The gas separation device features an introduction pipe for the rare gas and another for the impurity gases, along with a flow meter and an arithmetic device that ensures precise control of the flow rates. Additionally, he has developed a method for producing a silicon nitride film that boasts high resistance to hydrofluoric acid and moisture, while maintaining appropriate internal stress on a substrate at controlled temperatures.
Career Highlights
Throughout his career, Masaya Yamawaki has worked with prominent companies such as Taiyo Nippon Sanso Corporation and SPP Technologies Co., Ltd. His work has significantly impacted the fields of gas separation and materials science.
Collaborations
Yamawaki has collaborated with notable colleagues, including Hiroshi Taka and Shoichi Murakami, contributing to various innovative projects and advancements in technology.
Conclusion
Masaya Yamawaki's innovative work in gas separation and silicon nitride film production highlights his importance as an inventor in these fields. His patents and collaborations reflect a commitment to advancing technology and improving industrial processes.