The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2024

Filed:

Sep. 27, 2021
Applicant:

Taiyo Nippon Sanso Corporation, Tokyo, JP;

Inventor:

Masaya Yamawaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/04 (2006.01); B01D 53/047 (2006.01); C01B 23/00 (2006.01);
U.S. Cl.
CPC ...
B01D 53/047 (2013.01); C01B 23/0052 (2013.01); B01D 2256/24 (2013.01); B01D 2257/102 (2013.01); B01D 2257/11 (2013.01); B01D 2259/40007 (2013.01);
Abstract

A gas separation method in which a rare as a first introduced gas and an impurity gas as a second introduced gas, are introduced into a raw material gas. Each of the flow rates of the first and second introduced gases is controlled based on the flow rates of the rare gas and impurity gas in the discharged gas from a rare gas using facility. A gas separation device includes an introduction pipe for introducing rare gas in a separation gas container into a raw material gas, an introduction pipe for introducing impurity gases in the separation gas container into the raw material gas, a flow meter provided in a supply pipe for supplying a discharged gas of a rare gas using facility, and an arithmetic device electrically connected to each of the flow meter the flow rate controller, and the flow rate controller.


Find Patent Forward Citations

Loading…