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CA, United States of America

Ekc Technology Inc.

USPTO Granted Patents = 91

EPO Patents = 1

Trademarks = 8

Forward Citations = 1,767

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98 inventors (with patents filed for the assignee):

Wai Mun Lee (41 out of 51 patents)

Robert J Small (25 out of 46 patents)

David J Maloney (9 out of 13 patents)

4. Ross Henry Hill (6 out of 12 patents)

5. Tomoko Suzuki (5 out of 45 patents)

6. Hua Cui (5 out of 5 patents)

7. Charles U Pittman, Jr (5 out of 12 patents)

8. Toshitaka Hiraga (5 out of 5 patents)

9. Shihying Lee (5 out of 5 patents)

10. Bakul P Patel (5 out of 5 patents)

11. Michael A Fury (5 out of 8 patents)

12. Maria L Peterson (5 out of 10 patents)

13. Xiqiang Yang (4 out of 31 patents)

14. Ajay Virkar (4 out of 33 patents)

15. Jerome Daviot (4 out of 4 patents)

Core Competencies:

Metal Nanostructures

Nanowire Composites

Transparent Films

Semiconductor Cleaning

Photoresist Stripping

Chemical Mechanical Planarization

Amidoxime Compounds

Fluoride Chemistries

Residue Removal

Ultrasonic Cleaning

Aqueous Cleaning Solutions

Nucleophilic Amine Compounds

91 patents: Sort by Forward Citations

1. 12407349 - Fused metal nanostructured networks, fusing solutions with reducing agents and methods for forming metal networks (2025-09-02),

2. 12394536 - Silver nanowire and noble-metal coated silver nanowire conductive polymer composites with low loading percolation conduction (2025-08-19),

3. 12264262 - Transparent films with control of light hue using nanoscale colorants (2025-04-01),

4. 12227661 - Method for processing metal nanowire ink with metal ions (2025-02-18),

5. 10155921 - Removal composition for selectively removing hard mask and methods thereof (2018-12-18),

6. 10005991 - Removal composition for selectively removing hard mask and methods thereof (2018-06-26),

7. 9972485 - Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material (2018-05-15),

8. 9481855 - Cleaning composition and method for cleaning a semiconductor device substrate after chemical mechanical polishing (2016-11-01),

9. 9257270 - Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material (2016-02-09),

10. 8951950 - Aluminum post-etch residue removal with simultaneous surface passivation (2015-02-10),

11. 8802609 - Nitrile and amidoxime compounds and methods of preparation for semiconductor processing (2014-08-12),

12. 8658583 - Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent (2014-02-25),

13. 8062429 - Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions (2011-11-22),

14. 8003587 - Semiconductor process residue removal composition and process (2011-08-23),

15. 7838483 - Process of purification of amidoxime containing cleaning solutions and their use (2010-11-23),

EKC Technology Inc. is a leading provider of innovative technology solutions. With a focus on delivering cutting-edge products and services, EKC is committed to helping businesses thrive in the digital era. Our team of experts specializes in software development, IT consulting, and project management. We work closely with our clients to understand their unique goals and challenges, offering tailored solutions that drive efficiency, productivity, and growth. Visit our website to learn more about how EKC Technology can empower your business's success.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

91 Patents

#2 in undefined, CA

#946 in California

#3,952 in US

#8,170 in the World

CA, United States of America

Ekc Technology Inc.

Forward Citations = 1,767

98 inventors:

Wai Mun Lee (41 out of 51 patents)

Robert J Small (25 out of 46 patents)

David J Maloney (9 out of 13 patents)

4. Ross Henry Hill (6 out of 12 patents)

5. Tomoko Suzuki (5 out of 45 patents)

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