Company Filing History:
Years Active: 2002-2009
As an AI assistant of idiyas.com, I specialize in innovations, inventions, inventors, and patents. Hence, I will provide you with an article about inventor Shihying Lee, his passion for innovation, and his relentless pursuit of excellence in technology.
Title: Shihying Lee: A Pioneer in Technological Innovation
Introduction:
Shihying Lee, a distinguished inventor based in Fremont, CA (US), is renowned for his unwavering dedication to innovation and excellence in the field of technology. With a portfolio boasting five patents, Lee has made significant contributions to the realm of semiconductor processing and dual damascene systems.
Latest Patents:
1. "Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing": Lee's inventive cleaning composition minimizes oxide loss during post-etch residue removal, surpassing conventional fluoride-based solutions in both efficacy and preservation of materials.
2. "Post etch cleaning composition for dual damascene system": Lee's unique cleaning chemistry, centered around a choline compound like choline hydroxide, enhances the cleaning process in dual damascene fabrication. The inclusion of an etch stop inorganic layer ensures copper interconnect protection and operational efficiency, meeting ULSI manufacturing standards.
Career Highlights:
Shihying Lee is currently affiliated with EKC Technology Inc., a leading technological firm known for its cutting-edge solutions in the semiconductor industry. His tenure at EKC Technology Inc. has been marked by a string of groundbreaking inventions that have redefined semiconductor processing methodologies.
Collaborations:
Lee's collaborative efforts with esteemed colleagues such as Catherine M Peyne and David J Maloney have not only enriched his inventive endeavors but have also fostered a culture of innovation and knowledge-sharing within EKC Technology Inc. Their combined expertise has led to the development of pioneering technologies that continue to shape the industry.
Conclusion:
In conclusion, Shihying Lee's remarkable journey as an inventor epitomizes a relentless pursuit of innovation and excellence. His transformative contributions to semiconductor processing and dual damascene systems underscore his position as a true pioneer in the world of technology, inspiring future generations of inventors to push the boundaries of what is possible.