The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Oct. 22, 2003
Applicants:
Richard William Charm, Brentwood, CA (US);
De-ling Zhou, Sunnyvale, CA (US);
Robert J. Small, Tuscon, AZ (US);
Shihying Lee, Fremont, CA (US);
Inventors:
Richard William Charm, Brentwood, CA (US);
De-Ling Zhou, Sunnyvale, CA (US);
Robert J. Small, Tuscon, AZ (US);
Shihying Lee, Fremont, CA (US);
Assignee:
EKC Technology, Inc., Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.
Charm, Richard. (2006). Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials (U.S. Patent No. 7135445). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7135445
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile