The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Oct. 22, 2003
De-ling Zhou, Sunnyvale, CA (US);
Jing Qiao, Fremont, CA (US);
Shihying Lee, Fremont, CA (US);
Bakul P. Patel, Pleasanton, CA (US);
Becky Min Hon, Milpitas, CA (US);
De-Ling Zhou, Sunnyvale, CA (US);
Jing Qiao, Fremont, CA (US);
Shihying Lee, Fremont, CA (US);
Bakul P. Patel, Pleasanton, CA (US);
Becky Min Hon, Milpitas, CA (US);
EKC Technology, Inc., Hayward, CA (US);
Abstract
The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.