David J Maloney

Title: **David J Maloney: Innovator in Semiconductor Processes**

Introduction

David J Maloney, based in Livermore, California, is a distinguished inventor with a prolific portfolio of 13 patents. His innovative contributions primarily focus on advancements in semiconductor processes and chemical mechanical polishing, making significant impacts in the field of material science and engineering.

Latest Patents

Among his latest patents is a notable invention titled "Semiconductor Process Residue Removal Composition and Process." This innovative residue remover is designed to eliminate polymeric material and etch residue using a specific combination of 2-(2-aminoethylamino)-ethanol and optional components, including other alkanolamine compounds, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. The process involves treating semiconductor wafers, especially those with titanium metallurgy, using this formulation, ensuring effective residue removal without damaging the underlying metal.

Another significant patent is the "Chemical Mechanical Polishing Composition and Process." This invention involves a tailored slurry that incorporates a selectively oxidizing and reducing compound to achieve differential removal of metal and dielectric materials. The formulation is enhanced by including effective chemical components such as hydroxylamine compound, ammonium persulfate, and compounds acting as indirect sources of hydrogen peroxide. This innovative approach ensures efficient mechanical polishing while preserving the integrity of the materials involved.

Career Highlights

David has demonstrated exceptional expertise throughout his career, notably with companies such as EKC Technology Inc. and DuPont Air Products Nanomaterials, LLC. His contributions in these organizations have been pivotal in integrating advanced materials processing techniques, which have helped push the boundaries of semiconductor technology.

Collaborations

Throughout his innovative journey, David has collaborated with notable professionals in the industry, including his coworkers Wai Mun Lee and Robert J Small. These partnerships have fostered an environment of shared knowledge and creativity, further enhancing the development of efficient technology in semiconductor processing.

Conclusion

David J Maloney's remarkable patent portfolio and contributions to the field of semiconductor processing underscore his role as a key innovator. His work on residue removal compositions and chemical mechanical polishing processes demonstrates the significant advancements that can be achieved through innovation. As technology continues to evolve, the importance of inventors like Maloney remains ever crucial in shaping the future of materials science.