The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Sep. 22, 2009
Applicant:
Wai Mun Lee, Fremont, CA (US);
Inventor:
Wai Mun Lee, Fremont, CA (US);
Assignee:
EKC Technology, Inc., Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
An improved method for making a photoresist stripping solution for a metal-containing semi-conductor substrate where the stripping solution comprises a blend of at least one organic sulfonic acid with a halogen-free hydrocarbon solvent wherein concentrations of trace amounts of residual sulfuric acid and sulfur trioxide in the blend are reduced to very low levels.
Lee, Wai. (2014). Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent (U.S. Patent No. 8658583). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8658583
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile