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For the Inventor, By the Inventor

Fremont, CA, United States of America

Wai Mun Lee

This inventor holds 51 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Semiconductor Cleaning (CPC class C11D). Top assignees: Ekc Technology Inc., Ekc Technologies, Inc., Ekc/dupont Electronics Technologies. Active years: 1983-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wai Mun Lee. Retrieved from https://idiyas.com/inventor/wai-mun-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 51 

% Patents Active = 68.6

 

Average Co-Inventor Count = 1.4

ph-index = 18

Forward Citations = 934(Granted Patents)

Forward Citations (Not Self Cited) = 773(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Milpitas, CA (US) (1983 - 2014)
  • Fremont, CA (US) (1994 - 2014)

Company Filing History:

goldMedal41 out of 93 
 
Ekc Technology Inc.
 patents
silverMedal1 out of 1 
 
Ekc Technologies, Inc.
 patent
bronzeMedal1 out of 1 
 
Ekc/dupont Electronics Technologies
 patent
4. 1 out of 157 
 
Simon Fraser University
 patents
5. 7 out of 834,513 
Other
 patents

Years Active: 1983-2014

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Areas of Expertise:
Amidoxime Compositions
Photoresist Stripping
Semiconductor Substrates
Residue Removal
Cleaning Solutions
Alkanolamine Compounds
Nucleophilic Amines
Trioka Acid
Organic Sulfonic Acid
Wafer Level Packaging
Etching Residue
Barrier Layers
51 patents (USPTO):Explore Patents
1. 8802609 - Nitrile and amidoxime compounds and methods of preparation for semiconductor processing (2014-08-12),
2. 8658583 - Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent (2014-02-25),
3. 8431516 - Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid (2013-04-30),
4. 8303839 - Trioka acid semiconductor cleaning compositions and methods of use (2012-11-06),
5. 8173584 - Composition and method for treating semiconductor substrate surface (2012-05-08),
6. 8148311 - Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid (2012-04-03),
7. 8148310 - Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid (2012-04-03),
8. 8101561 - Composition and method for treating semiconductor substrate surface (2012-01-24),
9. 8062429 - Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions (2011-11-22),
10. 8003587 - Semiconductor process residue removal composition and process (2011-08-23),
11. 7947130 - Troika acid semiconductor cleaning compositions and methods of use (2011-05-24),
12. 7838483 - Process of purification of amidoxime containing cleaning solutions and their use (2010-11-23),
13. 7579308 - Compositions and processes for photoresist stripping and residue removal in wafer level packaging (2009-08-25),
14. 7547669 - Remover compositions for dual damascene system (2009-06-16),
15. 7543592 - Compositions and processes for photoresist stripping and residue removal in wafer level packaging (2009-06-09),

Title: The Innovator Profile - Wai Mun Lee: Pioneering Semiconductor Processing Solutions in Fremont, CA

Introduction:

Wai Mun Lee, a distinguished inventor based in Fremont, CA, has made significant contributions to the field of semiconductor processing. With an impressive portfolio of 51 patents, Lee's innovative solutions have streamlined processes in the industry.

Latest Patents:

Lee's latest patents include groundbreaking inventions such as "Nitrile and Amidoxime Compounds and Methods of Preparation for Semiconductor Processing." These compositions are designed to effectively remove photoresist, polymeric materials, etching residues, and copper oxides from semiconductor substrates, enhancing the efficiency of semiconductor manufacturing.

Another notable patent by Lee is the "Method for Making a Photoresist Stripping Solution," which focuses on reducing trace amounts of residual sulfuric acid and sulfur trioxide in photoresist stripping solutions used for metal-containing semiconductor substrates. This method represents a significant advancement in semiconductor processing technology.

Career Highlights:

During his career, Wai Mun Lee has worked at EKC Technology Inc., a key player in the semiconductor industry known for its cutting-edge solutions. His expertise and innovative spirit have enabled him to spearhead various projects and advancements in semiconductor processing.

Collaborations:

Lee has collaborated with accomplished professionals in the field, including Robert J Small and David J Maloney. Together, they have worked on projects that have further pushed the boundaries of semiconductor processing technology, showcasing Lee's collaborative and team-oriented approach to innovation.

Conclusion:

In conclusion, Wai Mun Lee stands out as a visionary inventor in the realm of semiconductor processing. His dedication to pushing the boundaries of technology, coupled with his collaborative spirit, has cemented his reputation as a trailblazer in the industry. With a remarkable track record of patents and industry achievements, Lee continues to shape the future of semiconductor processing in Fremont, CA, and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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