The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Dec. 22, 2015
Applicant:
Ekc Technology;
Inventor:
Hua Cui, Castro Valley, CA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); C11D 3/00 (2006.01); C11D 3/39 (2006.01); C11D 11/00 (2006.01); C09K 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0206 (2013.01); C09K 13/00 (2013.01); C11D 3/0073 (2013.01); C11D 3/3947 (2013.01); C11D 11/0047 (2013.01); H01L 21/31111 (2013.01);
Abstract
A semiconductor processing composition and method for removing photoresist, polymeric materials, etching residues and copper oxide from a substrate comprising copper, low-k dielectric material and TiN, TiNxOy or W wherein the composition includes water, at least one halide anion selected from Clor Br, and, where the metal hard mask comprises only TiN or TiNxOy, optionally at least one hydroxide source.