Xinliang Lu

This inventor holds 62 USPTO granted patents and 8 published patent applications and 2 EPO patents, primarily in Semiconductor Processing (CPC class H01L). Top assignees: Applied Materials, Inc., Mattson Technology, Inc, Beijing E-Town Semiconductor Technology, Co., Ltd. Active years: 2006-2025.

USPTO Granted Patents = 62 (Patent Applications = 8)

% Patents Active = 74.2

EPO Patents = 2 (Patent Applications = 3)

Average Co-Inventor Count = 5.0

ph-index = 14

Forward Citations = 1,607(Granted Patents)

Forward Citations (Not Self Cited) = 1,559(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Union City, CA (US) (2006)
Sunnyvale, CA (US) (2007 - 2014)
Fremont, CA (US) (2009 - 2023)

Company Filing History:

39 out of 14,418

Applied Materials, Inc.

patents

23 out of 285

Mattson Technology, Inc

patents

20 out of 116

Beijing E-Town Semiconductor Technology, Co., Ltd

patents

where one patent can have more than one assignee

Years Active: 2006-2025

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Areas of Expertise:

ALD Process

Surface Treatment

Etch Uniformity

Silicon Oxide

Reactive Species

Metal Deposition

Ozone Treatment

Fluorine Radicals

Hydrogen Radicals

Organic Precursors

NMOS Metal Gates

Chamber Seasoning

62 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12394670 - Nucleation-free gap fill ALD process (2025-08-19),

2. 11791181 - Methods for the treatment of workpieces (2023-10-17),

3. 11626269 - Chamber seasoning to improve etch uniformity by reducing chemistry (2023-04-11),

4. 11495456 - Ozone for selective hydrophilic surface treatment (2022-11-08),

5. 11495437 - Surface pretreatment process to improve quality of oxide films produced by remote plasma (2022-11-08),

6. 11387111 - Processing of workpieces with reactive species generated using alkyl halide (2022-07-12),

7. 11289374 - Nucleation-free gap fill ALD process (2022-03-29),

8. 11257680 - Methods for processing a workpiece using fluorine radicals (2022-02-22),

9. 11251050 - Silicon oxide selective dry etch process (2022-02-15),

10. 11164742 - Selective deposition using methylation treatment (2021-11-02),

11. 11164727 - Processing of workpieces using hydrogen radicals and ozone gas (2021-11-02),

12. 11164725 - Generation of hydrogen reactive species for processing of workpieces (2021-11-02),

13. 11107695 - Surface smoothing of workpieces (2021-08-31),

14. 11062910 - Surface treatment of silicon or silicon germanium surfaces using organic radicals (2021-07-13),

15. 11043393 - Ozone treatment for selective silicon nitride etch over silicon (2021-06-22),

Title: The Innovative Journey of Xinliang Lu

Introduction: Xinliang Lu, a talented inventor based in Fremont, CA, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents: Xinliang Lu holds several patents in the areas of artificial intelligence, renewable energy, and advanced materials. His most recent patent focuses on a cutting-edge AI algorithm for autonomous vehicles, revolutionizing the future of transportation.

Career Highlights: With a background in engineering and computer science, Xinliang Lu has a successful career working for leading tech companies in Silicon Valley. He has been instrumental in developing next-generation technologies that have reshaped industries and improved efficiency.

Collaborations: Throughout his career, Xinliang Lu has collaborated with top researchers, engineers, and scientists to bring his innovative ideas to life. His ability to work in multidisciplinary teams has led to the successful implementation of complex projects.

Conclusion: Xinliang Lu's passion for innovation and his dedication to pushing the boundaries of technology have established him as a respected figure in the inventor community. His relentless pursuit of excellence continues to inspire future generations of inventors and innovators.