The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Sep. 18, 2020
Mattson Technology, Inc., Fremont, CA (US);
Beijing E-town Semiconductor Technology, Co., Ltd, Beijing, CN;
Ting Xie, Fremont, CA (US);
Hua Chung, Saratoga, CA (US);
Haochen Li, Fremont, CA (US);
Xinliang Lu, Fremont, CA (US);
Shawming Ma, Sunnyvale, CA (US);
Haichun Yang, San Jose, CA (US);
Michael X. Yang, Palo Alto, CA (US);
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD, Beijing, CN;
MATTSON TECHNOLOGY, INC., Fremont, CA (US);
Abstract
Systems and methods for thermal treatment of a workpiece are provided. In one example, a method for conducting a treatment process on a workpiece, such as a thermal treatment process, an annealing treatment process, an oxidizing treatment process, or a reducing treatment process in a processing apparatus is provided. The processing apparatus includes a plasma chamber and a processing chamber. The plasma chamber and the processing chamber are separated by a plurality of separation grids or grid plates. The separation grids or grid plates operable to filter ions generated in the plasma chamber. The processing chamber has a workpiece support operable to support a workpiece.