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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Shawming Ma

USPTO Granted Patents = 47 

 

Average Co-Inventor Count = 2.3

ph-index = 13

Forward Citations = 568(Granted Patents)


Location History:

  • Palo Alto, CA (US) (2023)
  • Sunnyvale, CA (US) (1999 - 2024)

Company Filing History:

goldMedal25 out of 278 
 
Mattson Technology, Inc
 patents
silverMedal23 out of 116 
 
Beijing E-town Semiconductor Technology, Co., Ltd
 patents
bronzeMedal9 out of 13,713 
 
Applied Materials, Inc.
 patents
4. 4 out of 4,671 
 
Agilent Technologies, Inc.
 patents
5. 4 out of 9,638 
 
Hewlett-packard Company
 patents
6. 1 out of 1 
 
Agilent Technologies Texas Instruments Incorporated
 patent
7. 1 out of 29,263 
 
Texas Instruments Corporation
 patents
8. 1 out of 1 
 
Beijing E-town Semiconductor Co, , Ltd.
 patent
9. 3 out of 832,843 
Other
 patents
where one patent can have more than one assignee

Years Active: 1999-2025

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Areas of Expertise:
Inductively Coupled Plasma
Atomic Layer Etching
Thermal Processing Systems
Plasma Processing Apparatus
High Aspect Ratio Structures
Ferroelectric Capacitors
Dielectric Etch Processes
Photoresist Stripping
Plasma Charging Damage
Conductive Mesh Connections
Image Sensor Arrays
Ink Jet Nozzle Fabrication
47 patents (USPTO):Explore Patents
1. 12347677 - Enhanced ignition in inductively coupled plasmas for workpiece processing (2025-07-01),
2. 12159789 - Atomic layer etch process using plasma in conjunction with a rapid thermal activation process (2024-12-03),
3. 12119216 - Arc lamp with forming gas for thermal processing systems (2024-10-15),
4. 12002652 - Variable mode plasma chamber utilizing tunable plasma potential (2024-06-04),
5. 11848204 - Enhanced ignition in inductively coupled plasmas for workpiece processing (2023-12-19),
6. 11791181 - Methods for the treatment of workpieces (2023-10-17),
7. 11764072 - Method for processing a workpiece using a multi-cycle thermal treatment process (2023-09-19),
8. 11721539 - Arc lamp with forming gas for thermal processing systems (2023-08-08),
9. 11508560 - Focus ring adjustment assembly of a system for processing workpieces under vacuum (2022-11-22),
10. 11348784 - Enhanced ignition in inductively coupled plasmas for workpiece processing (2022-05-31),
11. 11348767 - Plasma processing apparatus having a focus ring adjustment assembly (2022-05-31),
12. 11289323 - Processing of semiconductors using vaporized solvents (2022-03-29),
13. 11264249 - Carbon containing hardmask removal process using sulfur containing process gas (2022-03-01),
14. 11201036 - Plasma strip tool with uniformity control (2021-12-14),
15. 11189464 - Variable mode plasma chamber utilizing tunable plasma potential (2021-11-30),

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