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Sunnyvale, CA, United States of America

Shawming Ma

USPTO Granted Patents = 47 (Patent Applications = 18)

EPO Patents = 3 (Patent Applications = 2)

Average Co-Inventor Count = 2.3

ph-index = 13

Forward Citations = 568(Granted Patents)

Location History:

Palo Alto, CA (US) (2023)
Sunnyvale, CA (US) (1999 - 2024)

Company Filing History:

Mattson Technology, Inc

Beijing E-town Semiconductor Technology, Co., Ltd

9 out of 13,684

Applied Materials, Inc.

4. 4 out of 4,667

Agilent Technologies, Inc.

5. 4 out of 9,638

Hewlett-packard Company

Agilent Technologies Texas Instruments Incorporated

7. 1 out of 29,232

Texas Instruments Corporation

Beijing E-town Semiconductor Co, , Ltd.

9. 3 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1999-2025

where 'Filed Patents' based on already Granted Patents

47 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12347677 - Enhanced ignition in inductively coupled plasmas for workpiece processing (2025-07-01),

2. 12159789 - Atomic layer etch process using plasma in conjunction with a rapid thermal activation process (2024-12-03),

3. 12119216 - Arc lamp with forming gas for thermal processing systems (2024-10-15),

4. 12002652 - Variable mode plasma chamber utilizing tunable plasma potential (2024-06-04),

5. 11848204 - Enhanced ignition in inductively coupled plasmas for workpiece processing (2023-12-19),

6. 11791181 - Methods for the treatment of workpieces (2023-10-17),

7. 11764072 - Method for processing a workpiece using a multi-cycle thermal treatment process (2023-09-19),

8. 11721539 - Arc lamp with forming gas for thermal processing systems (2023-08-08),

9. 11508560 - Focus ring adjustment assembly of a system for processing workpieces under vacuum (2022-11-22),

10. 11348784 - Enhanced ignition in inductively coupled plasmas for workpiece processing (2022-05-31),

11. 11348767 - Plasma processing apparatus having a focus ring adjustment assembly (2022-05-31),

12. 11289323 - Processing of semiconductors using vaporized solvents (2022-03-29),

13. 11264249 - Carbon containing hardmask removal process using sulfur containing process gas (2022-03-01),

14. 11201036 - Plasma strip tool with uniformity control (2021-12-14),

15. 11189464 - Variable mode plasma chamber utilizing tunable plasma potential (2021-11-30),

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