The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Feb. 24, 2020
Applicants:

Mattson Technology, Inc., Fremont, CA (US);

Beijing E-town Semiconductor Technology, Co., Ltd, Beijing, CN;

Inventors:

Michael X. Yang, Palo Alto, CA (US);

Shawming Ma, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/324 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/46 (2006.01); F27B 5/04 (2006.01); F27B 17/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/324 (2013.01); C23C 16/463 (2013.01); F27B 5/04 (2013.01); F27B 17/0025 (2013.01); H01L 21/67023 (2013.01); H01L 21/67063 (2013.01); H01L 21/67098 (2013.01); H01L 21/67115 (2013.01); H01L 21/68735 (2013.01);
Abstract

A method for processing a workpiece is provided. The method can include placing a workpiece on a susceptor disposed within a processing chamber. The method can include performing a multi-cycle thermal treatment process on the workpiece in the processing chamber. The multi-cycle thermal treatment process can include at least two thermal cycles. Each thermal cycle of the at least two thermal cycles can include performing a first treatment on the workpiece at a first temperature; heating a device side surface of the workpiece to a second temperature in less than one second; performing a second treatment on the workpiece at approximately the second temperature; and cooling the workpiece subsequent to performing the second treatment.


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