The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Dec. 13, 2019
Mattson Technology, Inc., Fremont, CA (US);
Beijing E-town Semiconductor Technology, Co., Ltd., Beijing, CN;
Fen Dai, Fremont, CA (US);
Tinghao Wang, Fremont, CA (US);
Oliver D. Jan, Fremont, CA (US);
Moo-Hyun Kim, Dublin, CA (US);
Shawming Ma, Sunnyvale, CA (US);
Zhongming Liu, Wuhan, CN;
Mattson Technology, Inc., Fremont, CA (US);
Beijing E-Town Semiconductor Technology Co., Ltd., Beijing, CN;
Abstract
Apparatus, systems, and methods for conducting a hardmask (e.g., carbon containing hardmask) removal process on a workpiece are provided. In one example implementation, a process can include admitting a process gas into a plasma chamber, generating a plasma in the plasma chamber from the process gas using an inductively coupled plasma source, and exposing the carbon containing hardmask to the plasma to remove at least a portion of the carbon containing hardmask. The process gas can include a sulfur containing gas. The process gas does not include a halogen containing gas. The inductively coupled plasma source can be separated from the plasma chamber by a grounded electrostatic shield to reduce capacitive coupling between the inductively coupled plasma source and the plasma.