Company Filing History:
1 out of 278 
1 out of 116 Years Active: 2022
Title: Innovations of Zhongming Liu in Hardmask Removal Processes
Introduction
Zhongming Liu is a notable inventor based in Wuhan, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of hardmask removal processes. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
Zhongming Liu holds a patent for a "Carbon containing hardmask removal process using sulfur containing process gas." This patent describes an apparatus, systems, and methods for conducting a hardmask removal process on a workpiece. In one implementation, the process involves admitting a process gas into a plasma chamber, generating a plasma from the process gas using an inductively coupled plasma source, and exposing the carbon containing hardmask to the plasma to remove at least a portion of it. Notably, the process gas includes a sulfur containing gas and does not contain a halogen containing gas. The design also features a grounded electrostatic shield to reduce capacitive coupling between the plasma source and the plasma chamber.
Career Highlights
Throughout his career, Zhongming Liu has worked with prominent companies in the semiconductor industry. He has been associated with Mattson Technology, Inc. and Beijing E-town Semiconductor Technology Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor processing.
Collaborations
Zhongming Liu has collaborated with several professionals in his field, including Fen Dai and Tinghao Frank Wang. These collaborations have contributed to the advancement of technologies related to hardmask removal processes.
Conclusion
Zhongming Liu's contributions to the field of semiconductor technology, particularly through his patented processes, demonstrate his innovative spirit and commitment to advancing manufacturing techniques. His work continues to influence the industry and pave the way for future developments.