Moo-Hyun Kim

Title: Moo-Hyun Kim: Innovator in Semiconductor Process Technologies

Introduction

Moo-Hyun Kim is an accomplished inventor based in Dublin, California, with a notable contribution to the field of semiconductor technology. He holds a patent that outlines a sophisticated process for removing carbon-containing hardmasks, which plays a critical role in semiconductor fabrication.

Latest Patents

Moo-Hyun Kim's patent focuses on a carbon-containing hardmask removal process that utilizes a sulfur-containing process gas. The patent describes apparatuses, systems, and methods for conducting the hardmask removal process on a workpiece. The innovative process includes the admission of a specially formulated process gas into a plasma chamber, generating plasma from the gas using an inductively coupled plasma source. This allows for the effective removal of a portion of the carbon-containing hardmask by exposing it to the generated plasma. Notably, the process gas excludes halogen-containing components, ensuring a safer and more efficient operation. The use of a grounded electrostatic shield further enhances the system by minimizing capacitive coupling between the plasma source and the chamber.

Career Highlights

Moo-Hyun Kim has demonstrated his expertise through his work at reputable companies in the semiconductor industry, including Mattson Technology, Inc. and Beijing E-town Semiconductor Technology Co., Ltd. His experience at these organizations has contributed significantly to the advancement of semiconductor process technologies.

Collaborations

Throughout his career, Moo-Hyun Kim has had the opportunity to collaborate with industry professionals, including colleagues Fen Dai and Tinghao Frank Wang. Their joint efforts have likely fostered innovation and contributed to technological advancements in the semiconductor field.

Conclusion

Moo-Hyun Kim stands out as a key inventor in the realm of semiconductor manufacturing processes, evidenced by his patented method for efficiently removing carbon-containing hardmasks. His contributions, shaped by collaborative efforts and professional experiences with esteemed companies, highlight his prominent role in advancing technology in this critical industry.