Company Filing History:
3 out of 278 
2 out of 116 Years Active: 2019-2023
Title: Innovations by Haochen Li in Thermal Treatment and Semiconductor Fabrication
Introduction
Haochen Li is a notable inventor based in Fremont, CA, who has made significant contributions to the fields of thermal treatment and semiconductor fabrication. With a total of three patents to his name, Li's work focuses on advanced methods that enhance the efficiency and effectiveness of processing workpieces.
Latest Patents
Li's latest patents include innovative methods for the treatment of workpieces. One of his notable inventions involves systems and methods for thermal treatment, which provide a comprehensive approach to conducting various treatment processes, such as annealing and oxidizing. This method utilizes a processing apparatus that features a plasma chamber and a processing chamber, separated by grids that filter ions generated in the plasma chamber. This design ensures that the workpiece is effectively supported during the treatment process.
Another significant patent by Li addresses the integration of material removal and surface treatment in semiconductor device fabrication. This process involves generating organic radicals through the excitation of hydrogen or inert gas molecules in a remote plasma source. These radicals can then react with silicon and silicon germanium surfaces, providing stability in air and reducing surface oxidation. This innovation eliminates the need for native surface oxide removal before subsequent processing steps, streamlining the fabrication process.
Career Highlights
Throughout his career, Haochen Li has worked with prominent companies in the semiconductor industry, including Mattson Technology, Inc. and Beijing E-town Semiconductor Technology Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor technology.
Collaborations
Li has collaborated with several professionals in his field, including Michael Xiaoxuan Yang and Hua Chung. These collaborations have likely fostered an environment of innovation and knowledge sharing, further enhancing the impact of his work.
Conclusion
Haochen Li's contributions to thermal treatment and semiconductor fabrication demonstrate his commitment to innovation and excellence in engineering. His patents reflect a deep understanding of the complexities involved in processing workpieces, making him a valuable figure in the industry.
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