The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2022

Filed:

Oct. 01, 2019
Applicants:

Mattson Technology, Inc., Fremont, CA (US);

Beijing E-town Semiconductor Technology, Co., Ltd, Beijing, CN;

Inventors:

Ting Xie, Fremont, CA (US);

Xinliang Lu, Fremont, CA (US);

Hua Chung, Saratoga, CA (US);

Michael X. Yang, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); H01L 21/02 (2006.01); C23C 16/50 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02271 (2013.01); C23C 16/0218 (2013.01); C23C 16/50 (2013.01); C23C 16/458 (2013.01); C23C 2222/00 (2013.01);
Abstract

Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include placing the workpiece on a workpiece support in a processing chamber. The method can include admitting a process gas into the processing chamber. The process gas can include an ozone gas. The method can include exposing the silicon nitride layer and the low-k dielectric layer to the process gas to modify a surface wetting angle of the silicon nitride layer.


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