The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2023
Filed:
Mar. 15, 2021
Applicants:
Mattson Technology, Inc., Fremont, CA (US);
Beijing E-town Semiconductor Technology, Co., Ltd, Beijing, CN;
Inventors:
Assignees:
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD, Beijing, CN;
MATTSON TECHNOLOGY, INC., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); H01J 37/32467 (2013.01); H01L 21/31116 (2013.01); H01L 21/67069 (2013.01); H01J 37/3211 (2013.01); H01J 37/32174 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3341 (2013.01);
Abstract
Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include conducting a pre-treatment process on a processing chamber to generate a hydrogen radical affecting layer on a surface of the processing chamber prior to performing a hydrogen radical based surface treatment process on a workpiece in the processing chamber. In this manner, a pretreatment process can be conducted to condition a processing chamber to increase uniformity of hydrogen radical exposure to a workpiece.