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For the Inventor, By the Inventor

Hsinchu, Taiwan

Wei-Jung Lin

This inventor holds 68 USPTO granted patents and 27 published patent applications, primarily in Semiconductor Manufacturing (CPC class H01L). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Chang Chun Plastics Co., Ltd., International Currency Technologies Corporation. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei-Jung Lin. Retrieved from https://idiyas.com/inventor/wei-jung-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 68 

% Patents Active = 83.8

Average Co-Inventor Count = 5.9

ph-index = 4

Forward Citations = 99(Granted Patents)

Forward Citations (Not Self Cited) = 88(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Taipei, TW (2006 - 2021)
  • Hsin-Chu, TW (2016 - 2024)

Company Filing History:

goldMedal65 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal1 out of 103 
 
Chang Chun Plastics Co., Ltd.
 patents
bronzeMedal1 out of 72 
 
International Currency Technologies Corporation
 patents
4. 1 out of 481 
 
Taiwan Semiconductor Manufacturing Co., Ltd.
 patents

Years Active: 2006-2026

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Areas of Expertise:
Semiconductor Devices
Conductive Features
Contact Formation
Silicide Contacts
Phase Control
Bottom-Up Filling
Device Structures
Manufacturing Methods
Via Configurations
Thermal Management
Transistor Contacts
Material Removal
68 patents (USPTO):Explore Patents
1. 12677461 - Fin field-effect transistor device and methods of forming (2026-07-07),
2. 12635497 - Semiconductor arrangement and method for making (2026-05-19),
3. 12635207 - Semiconductor devices and methods of fabricating the same (2026-05-19),
4. 12598795 - Semiconductor devices and method of forming the same (2026-04-07),
5. 12538776 - Methods for selectively removing material (2026-01-27),
6. 12538543 - Methods of manufacture of semiconductor devices (2026-01-27),
7. 12482705 - Conductive feature formation and structure using bottom-up filling deposition (2025-11-25),
8. 12419072 - Transistor source/drain contacts and methods of forming the same (2025-09-16),
9. 12417945 - Contact features of semiconductor device and method of forming same (2025-09-16),
10. 12328890 - Contact with a silicide region (2025-06-10),
11. 12308292 - Methods of forming semiconductor device structures (2025-05-20),
12. 12288716 - Phase control in contact formation (2025-04-29),
13. 12278188 - Different via configurations for different via interface requirements (2025-04-14),
14. 12272600 - Contact features of semiconductor device and method of forming same (2025-04-08),
15. 12237218 - Method of fabricating contact structure (2025-02-25),

Certainly! Here is the article about inventor Wei-Jung Lin:

Title: Wei-Jung Lin: A Visionary Inventor Revolutionizing Tech Innovation

Introduction:

Wei-Jung Lin, a renowned inventor based in Hsinchu, TW, has established himself as a pioneer in the global tech community with his relentless pursuit of innovation and groundbreaking contributions to technology.

Latest Patents:

With an impressive portfolio of 50 patents, Wei-Jung Lin continues to push the boundaries of technological advancement. His latest patents include "Conductive Feature Formation and Structure" and "Phase Control in Contact Formation", showcasing his expertise in the field of semiconductor technology.

Career Highlights:

Wei-Jung Lin's illustrious career has seen him make significant strides in various top-tier companies, including Taiwan Semiconductor Manufacturing Company Limited (TSMC) and Chang Chun Plastics Co., Ltd. His innovative approaches to conductive feature formation and phase control have earned him a stellar reputation among his peers.

Collaborations:

Throughout his career, Wei-Jung Lin has collaborated with esteemed professionals in the industry, including Chih-Wei Chang and Hong-Mao Lee. Together, they have worked on cutting-edge projects that have revolutionized the tech landscape.

Conclusion:

In conclusion, Wei-Jung Lin's passion for innovation and his dedication to creating technology that makes a difference have solidified his position as a visionary inventor in the global tech arena. His contributions continue to inspire future generations of inventors and researchers, leaving an indelible mark on the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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