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For the Inventor, By the Inventor

Mountain View, CA, United States of America

Wai-Fan Yau

This inventor holds 60 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Low Dielectric Films (CPC class H01L). Top assignees: Applied Materials, Inc., Novellus Systems Incorporated, Other. Active years: 1999-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wai-Fan Yau. Retrieved from https://idiyas.com/inventor/wai-fan-yau

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 60 

% Patents Active = 70.0


Average Co-Inventor Count = 5.4

ph-index = 32

Forward Citations = 5,596(Granted Patents)

Forward Citations (Not Self Cited) = 5,492(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Moutain View, CA (US) (2001)
  • Mountan View, CA (US) (2002)
  • Mountain View, CA (US) (1999 - 2010)
  • Los Altos, CA (US) (2003 - 2016)

Company Filing History:

goldMedal53 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal6 out of 993 
 
Novellus Systems Incorporated
 patents
bronzeMedal1 out of 834,570 
Other
 patents

Years Active: 1999-2016

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Areas of Expertise:
Chemical Vapor Deposition
Low Dielectric Constant
Plasma Etching
Photomask Fabrication
Conformal Dielectrics
Silicon Compounds
Dielectric Films
Etch Stops
Copper Interconnects
Anti-Reflective Coating
Organosilane Compounds
Plasma-Assisted Processes
60 patents (USPTO):Explore Patents
1. 9257302 - CVD flowable gap fill (2016-02-09),
2. 8293430 - Method for etching a molybdenum layer suitable for photomask fabrication (2012-10-23),
3. 8187951 - CVD flowable gap fill (2012-05-29),
4. 7888273 - Density gradient-free gap fill (2011-02-15),
5. 7790334 - Method for photomask plasma etching using a protected mask (2010-09-07),
6. 7678709 - Method of forming low-temperature conformal dielectric films (2010-03-16),
7. 7658969 - Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same (2010-02-09),
8. 7651725 - Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond (2010-01-26),
9. 7629227 - CVD flowable gap fill (2009-12-08),
10. 7560377 - Plasma processes for depositing low dielectric constant films (2009-07-14),
11. 7482247 - Conformal nanolaminate dielectric deposition and etch bag gap fill process (2009-01-27),
12. 7320942 - Method for removal of metallic residue after plasma etching of a metal layer (2008-01-22),
13. 7227244 - Integrated low k dielectrics and etch stops (2007-06-05),
14. 7205249 - CVD plasma assisted low dielectric constant films (2007-04-17),
15. 7160821 - Method of depositing low k films (2007-01-09),

Title: Inventor Wai-Fan Yau - Pioneering Innovations in Mountain View, CA

Introduction: Wai-Fan Yau is a visionary inventor based in Mountain View, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wai-Fan Yau holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Wai-Fan Yau has worked with leading tech companies, research institutions, and universities, playing a key role in developing cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Wai-Fan Yau has collaborated with top engineers, scientists, and researchers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Wai-Fan Yau's relentless pursuit of innovation and his passion for creating transformative technologies continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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