The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
May. 01, 2012
Feng Wang, Fremont, CA (US);
Brian LU, Fremont, CA (US);
Nerissa Draeger, Fremont, CA (US);
Vishal Gauri, Fremont, CA (US);
Raashina Humayun, Fremont, CA (US);
Michal Danek, Cupertino, CA (US);
Bart Van Schravendijk, Sunnyvale, CA (US);
Lakshminarayana Nittala, Sunnyvale, CA (US);
Feng Wang, Fremont, CA (US);
Victor Y. Lu, Santa Cruz, CA (US);
Brian Lu, Fremont, CA (US);
Wai-Fan Yau, Los Altos, CA (US);
Nerissa Draeger, Fremont, CA (US);
Vishal Gauri, Fremont, CA (US);
Raashina Humayun, Fremont, CA (US);
Michal Danek, Cupertino, CA (US);
Bart van Schravendijk, Sunnyvale, CA (US);
Lakshminarayana Nittala, Sunnyvale, CA (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
Provided are methods of filling gaps on a substrate by creating flowable silicon oxide-containing films. The methods involve introducing vapor-phase silicon-containing precursor and oxidant reactants into a reaction chamber containing the substrate under conditions such that a condensed flowable film is formed on the substrate. The flowable film at least partially fills gaps on the substrate. In certain embodiments, the methods involve using a catalyst in the formation of the film. The catalyst may be incorporated into one of the reactants and/or introduced as a separate reactant.