Sunnyvale, CA, United States of America

Lakshminarayana Nittala

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.3

ph-index = 5

Forward Citations = 441(Granted Patents)


Company Filing History:


Years Active: 2012-2016

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: Lakshminarayana Nittala: Innovator in Semiconductor Technology

Introduction

Lakshminarayana Nittala is a prominent inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative work focuses on methods for filling gaps on substrates, which is crucial in the manufacturing of semiconductor devices.

Latest Patents

Nittala's latest patents include groundbreaking methods for creating flowable silicon oxide-containing films. One of his notable inventions, titled "CVD flowable gap fill," provides methods for filling gaps on a substrate by introducing vapor-phase silicon-containing precursor and oxidant reactants into a reaction chamber. This process results in a condensed flowable film that partially fills the gaps on the substrate. In certain embodiments, a catalyst is used in the formation of the film, which may be incorporated into one of the reactants or introduced separately.

Another significant patent is "Flowable oxide deposition using rapid delivery of process gases." This invention outlines methods and apparatus for filling gaps on partially manufactured semiconductor substrates with dielectric material. The methods involve introducing a first process gas into the processing chamber while accumulating a second process gas at a higher pressure in an accumulator. The second process gas is then rapidly introduced into the processing chamber, allowing flowable silicon-containing films to form on the substrate surface and fill the gaps.

Career Highlights

Lakshminarayana Nittala is currently employed at Novellus Systems Incorporated, where he continues to advance semiconductor manufacturing technologies. His work has been instrumental in improving the efficiency and effectiveness of gap-filling processes in semiconductor fabrication.

Collaborations

Nittala has collaborated with several talented individuals in his field, including Nerissa Sue Draeger and Bart Jan Van Schravendijk. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Lakshminarayana Nittala is a key figure in the semiconductor industry, with a focus on innovative gap-filling methods that enhance manufacturing processes. His contributions through patents and collaborations continue to shape the future of semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…