The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Dec. 09, 2010
Kaihan Ashtiani, Cupertino, CA (US);
Michael Wood, San Jose, CA (US);
John Drewery, Santa Clara, CA (US);
Naohiro Shoda, Los Gatos, CA (US);
Bart Van Schravendijk, Sunnyvale, CA (US);
Lakshminarayana Nittala, Sunnyvale, CA (US);
Nerissa Draeger, Fremont, CA (US);
Kaihan Ashtiani, Cupertino, CA (US);
Michael Wood, San Jose, CA (US);
John Drewery, Santa Clara, CA (US);
Naohiro Shoda, Los Gatos, CA (US);
Bart van Schravendijk, Sunnyvale, CA (US);
Lakshminarayana Nittala, Sunnyvale, CA (US);
Nerissa Draeger, Fremont, CA (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
Novel gap fill schemes involving depositing both flowable oxide films and high density plasma chemical vapor deposition oxide (HDP oxide) films are provided. According to various embodiments, the flowable oxide films may be used as a sacrificial layer and/or as a material for bottom up gap fill. In certain embodiments, the top surface of the filled gap is an HDP oxide film. The resulting filled gap may be filled only with HDP oxide film or a combination of HDP oxide and flowable oxide films. The methods provide improved top hat reduction and avoid clipping of the structures defining the gaps.