John Stephen Drewery

Title: Innovations of John Stephen Drewery: A Leader in Semiconductor Technology

Introduction

John Stephen Drewery, based in San Jose, California, is an esteemed inventor known for his significant contributions to semiconductor technology, holding a remarkable 67 patents. His work has greatly influenced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest innovations is the "Electrostatic Chuck with Spatially Tunable RF Coupling to a Wafer." This invention focuses on a substrate support assembly in a processing chamber, which includes a baseplate, a dielectric layer, an electrode, and a series of channels designed to carry fluid, enhancing the support for semiconductor substrates.

Another key patent, "Methods and Systems for Advanced Ion Control for Etching Processes," describes a method for etching substrates with a mask material and target material. This innovation employs a plasma generation technique, alternating bias voltage settings to effectively remove target material exposed on the substrate, thereby refining the etching process.

Career Highlights

Drewery's career encompasses significant roles at industry-leading companies, including Lam Research Corporation and Novellus Systems Incorporated. His expertise and innovations have been crucial in advancing semiconductor technology and improving manufacturing efficiency within these organizations.

Collaborations

Throughout his career, Drewery has collaborated with notable professionals in the field, such as Steven T. Mayer and Alex Paterson. These partnerships have contributed to the wider reach and implementation of his innovative ideas.

Conclusion

John Stephen Drewery's contributions to semiconductor technology and his extensive array of patents mark him as a pivotal figure in the industry. His innovations not only demonstrate his exceptional creativity and technical skills but also showcase the potential for future advancements in semiconductor manufacturing and processing.