The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Aug. 31, 2022
Lam Research Corporation, Fremont, CA (US);
Yuhou Wang, Fremont, CA (US);
Alexander Miller Paterson, San Jose, CA (US);
John Stephen Drewery, San Jose, CA (US);
Ying Wu, Livermore, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma system includes a first matchless plasma source (MPS) that generates a first sinusoidal waveform having a first frequency. The plasma system includes a first filter coupled to the first MPS to filter a second frequency. The plasma system further includes a first capacitive circuit coupled to the first filter to balance reactances of the first filter and a radio frequency (RF) coil to further provide a first RF signal to a point. The plasma system includes a second MPS that generates a second sinusoidal waveform having the second frequency. The plasma system includes a second filter coupled to the second MPS to filter the first frequency. The plasma system includes a second capacitive circuit that is coupled to the second filter to balance a reactance of the second filter with the reactance of the RF coil to further provide a second RF signal to the point.