Company Filing History:
Years Active: 2014-2016
Title: Naohiro Shoda: Innovator in Conformal Film Deposition Technologies
Introduction
Naohiro Shoda is a prominent inventor based in Los Gatos, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of conformal film deposition. With a total of 2 patents to his name, Shoda's work has advanced the techniques used in high aspect ratio gap filling.
Latest Patents
Shoda's latest patents include innovative methods for conformal film deposition. One of his notable inventions is a method and apparatus for conformally depositing a dielectric oxide in high aspect ratio gaps in a substrate. This method involves providing a substrate with one or more gaps into a reaction chamber, where each gap has a depth to width aspect ratio of greater than about 5:1. A first dielectric oxide layer is deposited in the gaps using a technique known as CFD. The process includes etching a portion of the first dielectric oxide layer using plasma etch, resulting in a tapered profile from the top surface to the bottom surface of each gap. Another significant patent focuses on novel gap fill schemes that involve depositing both flowable oxide films and high-density plasma chemical vapor deposition oxide films. These methods improve top hat reduction and prevent clipping of the structures defining the gaps.
Career Highlights
Naohiro Shoda is currently employed at Novellus Systems Incorporated, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in developing advanced materials and processes that enhance the efficiency and effectiveness of semiconductor manufacturing.
Collaborations
Shoda has collaborated with notable colleagues such as Shankar Swaminathan and Bart K Van Schravendijk. These collaborations have contributed to the advancement of technologies in the semiconductor industry.
Conclusion
Naohiro Shoda's contributions to conformal film deposition technologies have made a significant impact on the semiconductor manufacturing industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.