Milpitas, CA, United States of America

Nerissa Sue Draeger

This inventor holds 26 USPTO granted patents and 5 published patent applications, primarily in Atomic Layer Etching. Top assignees: Novellus Systems Incorporated, Lam Research Corporation. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nerissa Sue Draeger. Retrieved from https://idiyas.com/inventor/nerissa-sue-draeger

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 57.7

Average Co-Inventor Count = 3.9

ph-index = 14

Forward Citations = 1,686(Granted Patents)


Location History:

  • Milpitas, CA (US) (2006 - 2011)
  • Fremont, CA (US) (2011 - 2022)

Company Filing History:


Years Active: 2006-2026

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Areas of Expertise:
Reflective Fourier Ptychography
Thermal Etching
Atomic Layer Etching
Dielectric Repair
Low-K Films
CVD Flowable Gap Fill
Porous Dielectric
Magnetic Tunnel Junctions
VLSI Fabrication
Process Gases
Copper Capping
Wet Etch Rate
26 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Nerissa Sue Draeger

Introduction

Nerissa Sue Draeger, a prominent inventor based in Milpitas, California, has made significant contributions to the field of etching technologies. With an impressive portfolio of 25 patents, her work addresses critical advancements in thermal etching and atomic layer etching processes. Draeger’s innovative techniques leverage machine learning and quantum mechanical simulations, setting new standards in the industry.

Latest Patents

Among her notable patents, Draeger has developed methods for predicting etch characteristics in thermal etching and atomic layer etching. Her machine learning model predicts etch reactions by analyzing chemical characteristics and the associated energies within various reaction pathways. This model allows for accurate predictions of etch characteristics when new thermal etch reaction data is inputted, showcasing her commitment to integrating advanced computational techniques in semiconductor processing.

Additionally, her patent on selective atomic layer etching outlines a method that intricately combines deposition and activation phases. By utilizing a combination of gases, the method enables selective etching of dielectric layers with precision, showcasing Draeger's proficiency in enhancing etching technology.

Career Highlights

Nerissa Sue Draeger has worked with notable companies in the field, including Novellus Systems Incorporated and Lam Research Corporation. Her experiences at these institutions have equipped her with substantial expertise in etching technologies and solidified her status as a key figure within the semiconductor industry.

Collaborations

Throughout her career, Draeger has collaborated with esteemed colleagues such as Bart Jan van Schravendijk and Lakshminarayana Nittala. These collaborations have not only fostered innovation but have also contributed to enhancing the overall research efforts within the etching domain.

Conclusion

Nerissa Sue Draeger exemplifies the spirit of innovation with her groundbreaking contributions to etching technologies. Her extensive patent portfolio and collaborative efforts highlight her role as a leading inventor in her field. Draeger's work continues to set a benchmark for future technological advancements, ensuring that the semiconductor industry evolves with cutting-edge solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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