The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Jan. 27, 2005
Madhavi Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Wai-fan Yau, Los Altos, CA (US);
Madhavi Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Wai-Fan Yau, Los Altos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for fabricating a photomask are disclosed herein. In one embodiment, a method for fabricating a photomask includes providing a filmstack having a molybdenum layer and a light-shielding layer in a processing chamber, patterning a first resist layer on the light-shielding layer, etching the light-shielding layer using the first resist layer as an etch mask, and etching the molybdenum layer using the patterned light-shielding layer and the patterned first resist layer as a composite mask.