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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Madhavi R Chandrachood

This inventor holds 36 USPTO granted patents and 3 published patent applications and 4 EPO patents, primarily in Plasma Etching. Top assignee: Applied Materials, Inc.. Active years: 1998-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Madhavi R Chandrachood. Retrieved from https://idiyas.com/inventor/madhavi-r-chandrachood

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 36 

% Patents Active = 75.0

 

Average Co-Inventor Count = 4.5

ph-index = 11

Forward Citations = 945(Granted Patents)


Company Filing History:

goldMedal36 out of 14,454 
 
Applied Materials, Inc.
 patents

Years Active: 1998-2024

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Areas of Expertise:
Plasma Etching
Photomask Fabrication
EUV Masks
Optical Sensors
Tunable Cathode
Reactor Design
Endpoint Detection
Chemical-Mechanical Polishing
Particle Contamination
Gas Distribution
Nano-Imprint Templates
Defect Reduction
36 patents (USPTO):Explore Patents
1. 11915932 - Plasma etching of mask materials (2024-02-27),
2. 11249386 - Extreme ultraviolet mask with backside coating (2022-02-15),
3. 10170280 - Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall (2019-01-01),
4. 9218944 - Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors (2015-12-22),
5. 8778574 - Method for etching EUV material layers utilized to form a photomask (2014-07-15),
6. 8568553 - Method and apparatus for photomask plasma etching (2013-10-29),
7. 8293430 - Method for etching a molybdenum layer suitable for photomask fabrication (2012-10-23),
8. 8202441 - Process for etching a metal layer suitable for use in photomask fabrication (2012-06-19),
9. 8017029 - Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside (2011-09-13),
10. 8012366 - Process for etching a transparent workpiece including backside endpoint detection steps (2011-09-06),
11. 8002946 - Mask etch plasma reactor with cathode providing a uniform distribution of etch rate (2011-08-23),
12. 7976671 - Mask etch plasma reactor with variable process gas distribution (2011-07-12),
13. 7967930 - Plasma reactor for processing a workpiece and having a tunable cathode (2011-06-28),
14. 7964818 - Method and apparatus for photomask etching (2011-06-21),
15. 7955516 - Etching of nano-imprint templates using an etch reactor (2011-06-07),

Title: The Innovative Mind of Madhavi R Chandrachood

Introduction:

Madhavi R Chandrachood is a pioneering inventor based in Sunnyvale, California. His groundbreaking work in the field of technology has led to numerous patents and innovations that have shaped the industry.

Latest Patents:

Madhavi R Chandrachood holds several recent patents in the areas of artificial intelligence, machine learning, and data analytics. His inventions have revolutionized how businesses approach data-driven decision-making processes.

Career Highlights:

With a career spanning over two decades, Madhavi R Chandrachood has worked for leading tech companies, contributing his expertise to cutting-edge projects. His passion for innovation and problem-solving has earned him a reputation as a visionary in the industry.

Collaborations:

Throughout his career, Madhavi R Chandrachood has collaborated with top researchers, engineers, and developers to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion:

Madhavi R Chandrachood's relentless pursuit of innovation and his dedication to pushing the boundaries of technology make him a true trailblazer in the field. His contributions have not only transformed industries but have also inspired the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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