The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Oct. 30, 2006
Richard Lewington, Hayward, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Darin Bivens, San Mateo, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Richard Lewington, Hayward, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Darin Bivens, San Mateo, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and defining a support plane for supporting a workpiece. The cathode has a hollow space formed within its interior. The reactor further includes a movable metal element within the hollow space and a mechanism for controlling a distance between the metal element and the support plane.