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For the Inventor, By the Inventor

Hayward, CA, United States of America

Richard Lewington

This inventor holds 17 USPTO granted patents and 1 published patent application and 4 EPO patents, primarily in Plasma Etching Technology. Top assignee: Applied Materials, Inc.. Active years: 2008-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard Lewington. Retrieved from https://idiyas.com/inventor/richard-lewington

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 82.4

 

Average Co-Inventor Count = 5.8

ph-index = 7

Forward Citations = 151(Granted Patents)


Company Filing History:

goldMedal17 out of 14,523 
 
Applied Materials, Inc.
 patents

Years Active: 2008-2019

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Areas of Expertise:
Plasma Reactor
Gas Injectors
Optical Sensors
Plasma Etching
Transparent Substrates
Endpoint Detection
Variable Gas Distribution
Cathode Uniformity
Metrology Integration
Dynamic Adjustment
Workpiece Processing
17 patents (USPTO):Explore Patents
1. 10170280 - Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall (2019-01-01),
2. 9218944 - Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors (2015-12-22),
3. 8568553 - Method and apparatus for photomask plasma etching (2013-10-29),
4. 8017029 - Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside (2011-09-13),
5. 8012366 - Process for etching a transparent workpiece including backside endpoint detection steps (2011-09-06),
6. 8002946 - Mask etch plasma reactor with cathode providing a uniform distribution of etch rate (2011-08-23),
7. 7976671 - Mask etch plasma reactor with variable process gas distribution (2011-07-12),
8. 7967930 - Plasma reactor for processing a workpiece and having a tunable cathode (2011-06-28),
9. 7964818 - Method and apparatus for photomask etching (2011-06-21),
10. 7943005 - Method and apparatus for photomask plasma etching (2011-05-17),
11. 7909961 - Method and apparatus for photomask plasma etching (2011-03-22),
12. 7846848 - Cluster tool with integrated metrology chamber for transparent substrates (2010-12-07),
13. 7601272 - Method and apparatus for integrating metrology with etch processing (2009-10-13),
14. 7520999 - Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another (2009-04-21),
15. 7504041 - Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator (2009-03-17),

Title: The Inventor Profile of Richard Lewington

Introduction: Richard Lewington is a renowned inventor based in Hayward, California, known for his groundbreaking contributions to various industries.

Latest Patents: Richard Lewington holds several patents in the fields of technology, healthcare, and consumer products, showcasing his diverse range of innovative ideas.

Career Highlights: With a career spanning over two decades, Richard Lewington has consistently pushed the boundaries of innovation, leading to the development of cutting-edge solutions that have revolutionized the way we live and work.

Collaborations: Throughout his career, Richard Lewington has collaborated with leading companies, research institutions, and universities to bring his inventions to life, demonstrating his ability to work effectively in multidisciplinary teams.

Conclusion: Richard Lewington's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor, shaping the future of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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