The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Oct. 30, 2006
Richard Lewington, Hayward, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Darin Bivens, San Mateo, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Richard Lewington, Hayward, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Darin Bivens, San Mateo, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor for etching a workpiece such as a rectangular or square mask, includes a vacuum chamber having a ceiling and a sidewall and a workpiece support pedestal within the chamber including a cathode having a surface for supporting a workpiece, the surface comprising plural respective zones, the respective zones of the surface being formed of respective materials of different electrical characteristics. The zones can be arranged concentrically relative to an axis of symmetry of the wafer support pedestal.