Introduction: Darin Bivens is a prominent inventor based in San Mateo, CA, with a remarkable portfolio of 11 patents. His work primarily focuses on advanced technologies in photomask plasma etching, contributing significantly to the semiconductor manufacturing industry. Bivens' innovative methods and apparatus are paving the way for enhanced precision in the etching process, crucial for the development of modern electronics.

Latest Patents: Among his latest patents, Bivens has developed several groundbreaking methodologies. One of his key inventions is the "Method and apparatus for photomask plasma etching", which involves an apparatus designed to etch photomasks in a highly controlled manner. The design includes a process chamber with a support pedestal for the photomask, an ion-neutral shield for managing ion distribution in plasma, and a deflector plate assembly to streamline gas flow during the etching process.

Another significant patent is the "Process for etching a transparent workpiece including backside endpoint detection steps." This innovation allows for the precise defining of patterns on transparent substrates. The patented method includes generating plasma in a reactor, etching through a photoresist pattern, and detecting interference patterns in reflected light to determine the depth of the etched structures. Both patents showcase Bivens' commitment to improving the efficiency and accuracy of photomask technologies.

Career Highlights: Darin Bivens is currently employed at Applied Materials, Inc., a leading company in materials engineering solutions for the semiconductor, flat panel display, and solar industries. His works are instrumental in optimizing processes that enhance quality and reduce costs in photomask production. Bivens' experience and expertise have established him as a valuable figure in the field of semiconductor manufacturing.

Collaborations: Throughout his career, Bivens has collaborated with notable professionals such as Madhavi R Chandrachood and Richard Lewington. These partnerships have fostered an environment of innovation and creativity, contributing to the advancement of technology within the company and the industry at large.

Conclusion: Darin Bivens’ contributions to the field of photomask plasma etching through his innovative patents are highly influential. His work at Applied Materials, Inc. and collaborations with esteemed colleagues highlight the collaborative nature of technological advancements in the semiconductor sector. As innovations continue to evolve, Bivens' impact on the industry will undoubtedly be felt for years to come.

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