The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
May. 03, 2006
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Richard Lewington, Hayward, CA (US);
Darin Bivens, San Mateo, CA (US);
Ajay Kumar, Cupertino, CA (US);
Ibrahim M. Ibrahim, Santa Clara, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Renee Koch, Brentwood, CA (US);
Sheeba J. Panayil, Santa Clara, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Richard Lewington, Hayward, CA (US);
Darin Bivens, San Mateo, CA (US);
Ajay Kumar, Cupertino, CA (US);
Ibrahim M. Ibrahim, Santa Clara, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Renee Koch, Brentwood, CA (US);
Sheeba J. Panayil, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for processing a workpiece in a plasma reactor chamber by applying RF source power to inner and outer source power applicators, and introducing a process gas into the reactor while rotating at least one of (a) the workpiece, (b) the outer source power applicator, about a radial tilt axis to a position at which the plasma distribution is nearly symmetrical, and translating the inner source power applicator relative to the outer source power applicator along the axis of symmetry to a location at which the spatial distribution is nearly uniform.