Company Filing History:
Years Active: 2008-2010
Title: The Innovative Contributions of Renee Koch
Introduction
Renee Koch is a prominent inventor based in Brentwood, CA (US). She has made significant contributions to the field of technology, particularly in the area of etching processes. With a total of 5 patents to her name, Renee has established herself as a key figure in her industry.
Latest Patents
Renee's latest patents include innovative methods for etching quartz. One notable patent is titled "Multi-step photomask etching with chlorine for uniformity control." This method involves providing a film stack on a substrate support in a processing chamber, where the quartz layer is partially exposed through a patterned layer. The etching process is executed in a multi-step manner, utilizing a combination of fluorocarbon and chlorine-containing process gases. Another significant patent is "Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another." This method enhances the processing of a workpiece in a plasma reactor chamber by applying RF source power and adjusting the position of the workpiece and power applicators for optimal plasma distribution.
Career Highlights
Renee Koch is currently employed at Applied Materials, Inc., where she continues to innovate and develop new technologies. Her work has been instrumental in advancing the capabilities of plasma processing and etching techniques.
Collaborations
Renee has collaborated with several talented individuals in her field, including Madhavi R Chandrachood and Richard Lewington. These collaborations have contributed to her success and the advancement of her projects.
Conclusion
Renee Koch's contributions to the field of technology through her innovative patents and collaborative efforts highlight her role as a leading inventor. Her work continues to influence the industry and pave the way for future advancements.