The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Oct. 30, 2006
Ajay Kumar, Cupertino, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Richard Lewington, Hayward, CA (US);
Darin Bivens, San Mateo, CA (US);
Amitabh Sabharwal, San Jose, CA (US);
Sheeba J. Panayil, Santa Clara, CA (US);
Alan Hiroshi Ouye, San Mateo, CA (US);
Ajay Kumar, Cupertino, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Richard Lewington, Hayward, CA (US);
Darin Bivens, San Mateo, CA (US);
Amitabh Sabharwal, San Jose, CA (US);
Sheeba J. Panayil, Santa Clara, CA (US);
Alan Hiroshi Ouye, San Mateo, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for etching photomasks are provided herein. The apparatus includes a process chamber with a shield above a substrate support. The shield comprises a plate with apertures, and the plate has two zones with at least one characteristic, such as material or potential bias, that is different from each other. The method provides for etching a photomask substrate with a distribution of ions and neutral species that pass through the shield.