The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Oct. 30, 2006
Richard Lewington, Hayward, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Darin Bivens, San Mateo, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Richard Lewington, Hayward, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Khiem K. Nguyen, San Jose, CA (US);
Darin Bivens, San Mateo, CA (US);
Madhavi R. Chandrachood, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method is provided for defining a pattern on a workpiece such as a transparent substrate or mask or a workpiece that is at least transparent within a range of optical wavelengths. The method includes defining a photoresist pattern on the top surface of the mask, the pattern including a periodic structure having a periodic spacing between elements of the structure. The method further includes placing the mask on a support pedestal in a plasma reactor chamber and generating a plasma in the chamber to etch the top surface of the mask through openings in the photoresist pattern. The method also includes transmitting light through the pedestal and through the bottom surface of the mask, while viewing through the support pedestal light reflected from the periodic structure and detecting an interference pattern in the reflected light. The method further includes determining from the interference pattern a depth to which periodic structure has been etched in the top surface.