San Jose, CA, United States of America

Khiem K Nguyen

This inventor holds 19 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Plasma Etching Technology. Top assignees: Applied Materials, Inc., Ultratech, Inc.. Active years: 2006-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Khiem K Nguyen. Retrieved from https://idiyas.com/inventor/khiem-k-nguyen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19 

% Patents Active = 78.9

 

Average Co-Inventor Count = 2.9

ph-index = 6

Forward Citations = 226(Granted Patents)


Company Filing History:


Years Active: 2006-2024

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Areas of Expertise:
Plasma Reactor
Endpoint Detection
Optical Sensors
Etch Processing
Lithography
LED Formation
Gas Injectors
Metrology Integration
Uniform Distribution
Transparent Substrates
Tunable Cathode
Cluster Tool
19 patents (USPTO):Explore Patents

Title: The Innovative Mind of Khiem K Nguyen

Introduction

Khiem K Nguyen is a renowned inventor based in San Jose, California, who has made significant contributions to the field of semiconductor processing. With an impressive portfolio of 19 patents, his work continues to influence the technology landscape, particularly in advanced etching and lithography processes.

Latest Patents

Khiem K Nguyen's latest patents showcase his ingenuity and forward-thinking approach. One of his notable inventions is the "Etch Processing System Having Reflective Endpoint Detection," which includes sophisticated wafer and photomask processing equipment. This etch processing system features an endpoint detection system equipped with a light source and a photodetector. The light source emits light towards an alignment region over a substrate support within an etch chamber. The photodetector receives reflections of this light, which are meticulously monitored for effective endpoint and process control. Additionally, another innovative patent, titled "Direct Lift Cathode for Lithography Mask Chamber," describes exemplary lithography mask processing chambers. These chambers include a substrate support with vertically translatable lift pins and a cover ring that defines a rectilinear substrate seat, enhancing processing efficiency.

Career Highlights

Khiem K Nguyen has worked with prestigious companies such as Applied Materials, Inc. and Ultratech, Inc. His experience in these dynamic environments has significantly shaped his expertise in semiconductor technology and patenting inventions.

Collaborations

Throughout his career, Khiem has collaborated with various talented professionals, including Richard Lewington and Michael N Grimbergen. These partnerships have fostered a creative environment that has facilitated the development of groundbreaking innovations in his field.

Conclusion

As a distinguished inventor, Khiem K Nguyen's contributions continue to drive advancements in semiconductor processing technologies. His extensive patent portfolio and collaborative efforts highlight his commitment to innovation, making a lasting impact on the industry and inspiring future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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