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For the Inventor, By the Inventor

San Jose, CA, United States of America

Ultratech, Inc.


USPTO Granted Patents = 138

% Expired Patents = 71.0


Trademarks = 8

Forward Citations = 1,296

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113 inventors (with patents filed for the assignee):

goldMedal Andrew M Hawryluk (38 out of 64 patents)

silverMedal David A Markle (24 out of 81 patents)

bronzeMedal Serguei Anikitchev (15 out of 30 patents)

4.  Yun Yu Wang (13 out of 257 patents)

5.  Somit Talwar (12 out of 34 patents)

6.  Boris Grek (11 out of 19 patents)

7.  Ganesh Sundaram (9 out of 10 patents)

8.  Arthur W Zafiropoulo (9 out of 9 patents)

9.  Emily M True (8 out of 8 patents)

10.  James McWhirter (8 out of 9 patents)

11.  Michael O Thompson (7 out of 30 patents)

12.  Romeo I Mercado (6 out of 26 patents)

13.  Shiyu Zhang (6 out of 13 patents)

14.  Jill Svenja Becker (6 out of 14 patents)

15.  Igor Landau (5 out of 7 patents)


Core Competencies:
Laser Annealing
Optical Systems
Atomic Layer Deposition
Gallium Nitride
Semiconductor Processing
Heteroepitaxial Layers
Thin Film Deposition
Photolithography
Electrical Connectors
Wafer Processing
Solder Interconnects
Plasma Processing

138 patents:

1. 12725956 - Electrical connector comprising two pluralities of flexible strips, one surrounding the other in an inserted configuration of the connector (2026-09-01),
2. 12562522 - Electrical connector comprising a user protective system (2026-02-24),
3. 12555949 - Electrical connector comprising two sleeves defining a closed equipotential cavity around a contact zone (2026-02-17),
4. 11600949 - Assembly comprising a first connector, a second connector and a coding system selectively allowing connection (2023-03-07),
5. 10468290 - Wafer chuck apparatus with micro-channel regions (2019-11-05),
6. 10353208 - High-efficiency line-forming optical systems and methods using a serrated spatial filter (2019-07-16),
7. 10351950 - Plasma enhanced ALD system (2019-07-16),
8. 10316406 - Methods of forming an ALD-inhibiting layer using a self-assembled monolayer (2019-06-11),
9. 10269662 - Scanning methods for focus control for lithographic processing of reconstituted wafers (2019-04-23),
10. 10249491 - Method and apparatus for forming device quality gallium nitride layers on silicon substrates (2019-04-02),
11. 10090153 - Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations (2018-10-02),
12. 10083843 - Laser annealing systems and methods with ultra-short dwell times (2018-09-25),
13. 10032883 - Silicon germanium heterojunction bipolar transistor structure and method (2018-07-24),
14. 10016843 - Systems and methods for reducing pulsed laser beam profile non-uniformities for laser annealing (2018-07-10),
15. 9960036 - Method and apparatus for forming device quality gallium nitride layers on silicon substrates (2018-05-01),
Ultratech, Inc., based in San Jose, CA, specializes in advanced laser annealing systems that are pivotal in semiconductor processing. The company focuses on core technologies such as optical systems, atomic layer deposition, and thin film deposition, contributing significantly to the development of gallium nitride and heteroepitaxial layers. Ultratech's innovations play a crucial role in enhancing the performance and efficiency of semiconductor devices, catering to the evolving needs of the technology sector.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Sep 29 2026

Ultratech, Inc.
138 Patents

#86 in San Jose, CA

#629 in California

#2,813 in US

#5,854 in the World

San Jose, CA (US)
San Jose, CA, United States of America

Ultratech, Inc.

Forward Citations = 1,296

113 inventors:

goldMedal Andrew M Hawryluk (38 out of 64 patents)

silverMedal David A Markle (24 out of 81 patents)

bronzeMedal Serguei Anikitchev (15 out of 30 patents)

4.  Yun Yu Wang (13 out of 257 patents)

5.  Somit Talwar (12 out of 34 patents)

Please report any incorrect information to [email protected]
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