Los Altos, CA, United States of America

Andrew M Hawryluk

This inventor holds 64 USPTO granted patents and 14 published patent applications, primarily in Laser Annealing Technology (CPC class H01L). Top assignees: Ultratech, Inc., Ultratech Stepper, Inc., The United States of America as Represented by the United States. Active years: 1989-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrew M Hawryluk. Retrieved from https://idiyas.com/inventor/andrew-m-hawryluk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 64 

% Patents Active = 53.1

Average Co-Inventor Count = 2.5

ph-index = 17

Forward Citations = 1,865(Granted Patents)

Forward Citations (Not Self Cited) = 1,778(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Modesto, CA (US) (1989 - 1999)
  • Los Altos Hills, CA (US) (2001 - 2011)
  • Lost Altos, CA (US) (2017)
  • Los, CA (US) (2018)
  • Los Altos, CA (US) (2008 - 2020)

Company Filing History:


Years Active: 1989-2020

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Areas of Expertise:
Laser Annealing
Semiconductor Manufacturing
Gallium Nitride
Optical Systems
Thermal Processing
Defect Annealing
LED Fabrication
Thin-Wafer Processing
Plasma Processing
Beam Stability
Photolithography
Capacitive Testing
64 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Andrew M. Hawryluk

Introduction

Andrew M. Hawryluk, based in Los Altos, California, is a distinguished innovator and inventor with a remarkable portfolio of 64 patents. His work primarily focuses on advancements in semiconductor manufacturing and laser processing technologies.

Latest Patents

Hawryluk's latest patents include groundbreaking systems for laser annealing and methods for melt-processing of metal layers. One of his significant innovations is the "Laser annealing systems and methods with ultra-short dwell times." This method enhances the traditional annealing process by pre-heating the wafer with a specific line image and rapidly scanning an annealing image, resulting in a dwell time range of just 10 ns to 500 ns. Such ultra-short dwell times are crucial for enabling effective surface or subsurface melt annealing of product wafers without compromising the integrity of device structures.

Another notable patent focuses on "Laser-based systems and methods for melt-processing of metal layers in semiconductor manufacturing." This method allows for the precise melting and recrystallization of metal layers within integrated circuits (ICs) without affecting the associated non-metal components. By scanning a focused laser spot over overlapping segments, the process not only improves the performance of the fabricated IC chips but also significantly reduces the resistivity of the metal used.

Career Highlights

Throughout his career, Hawryluk has worked with prominent companies, including Ultratech, Inc. and Ultratech Stepper, Inc. His contributions have significantly influenced the field of semiconductor technologies and have led to improvements in manufacturing processes.

Collaborations

Hawryluk has collaborated with notable professionals in the industry, including Yun Yu Wang and David A. Markle. These partnerships have fostered innovation and furthered advancements in semiconductor fabrication techniques.

Conclusion

Andrew M. Hawryluk stands as a pivotal figure in the realm of semiconductor innovations, showcasing how inventive methodologies in laser processes can lead to enhanced efficiencies in manufacturing. His extensive patent portfolio serves as a testament to his contributions, marking him as a significant inventor in the technology sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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