Kanagawa, Japan

Koichiro Tanaka

Average Co-Inventor Count = 2.0

ph-index = 46

Forward Citations = 7,968(Granted Patents)

Forward Citations (Not Self Cited) = 5,310(Sep 21, 2024)

DiyaCoin DiyaCoin 13.51 

Inventors with similar research interests:


Location History:

  • Katano, JP (1998)
  • Atsugi-shi, Kanagawa-ken JP (2000)
  • Tokyo, JP (1998 - 2003)
  • Yokohama, JP (2001 - 2009)
  • Kanagawa-ken, JP (2003 - 2011)
  • Takaraduka, JP (2006 - 2011)
  • Atsughi, JP (2011)
  • Hyogo, JP (2006 - 2017)
  • Takarazuka, JP (1995 - 2018)
  • Atsugia, JP (2018)
  • Kanagawa, JP (1998 - 2019)
  • Isehara, JP (2008 - 2019)
  • Atsugi, JP (2003 - 2021)


Years Active: 1995-2021

where 'Filed Patents' based on already Granted Patents

479 patents (USPTO):

Title: Koichiro Tanaka: Innovating the Semiconductor Industry

Introduction:

Koichiro Tanaka, a prolific inventor hailing from Kanagawa, Japan, has made significant contributions to the field of semiconductor technologies. With an impressive portfolio of 479 patents, Tanaka's work has revolutionized laser irradiation methods and semiconductor device manufacturing processes. This article delves into his latest patents, career highlights, notable collaborations, and the impact of his innovations.

Latest Patents:

Tanaka's recent patents demonstrate his expertise in laser irradiation and semiconductor devices. One notable invention is the "Laser Irradiation Method and Laser Irradiation Device," where a laser beam is slantly incident to a convex lens to create a linear-shaped laser beam on the irradiation surface. This technique simplifies optical adjustments and provides a more compact device, while preventing the return beam effectively.

Another groundbreaking patent, the "Semiconductor Device and Semiconductor Device Production System," introduces a method to prevent the formation of grain boundaries in the channel formation region of thin-film transistors (TFTs). By irradiating a semiconductor film with continuous wave laser light along patterned depression and projection portions, Tanaka's innovation ensures optimal mobility and current performance for TFTs.

Career Highlights:

Tanaka's notable career spans across renowned companies in the semiconductor industry. He has contributed significantly to the research and development efforts of Semiconductor Energy Laboratory Co., Ltd. and Panasonic Corporation. Through these roles, he has consistently explored novel technologies to improve semiconductor manufacturing processes, pushing the boundaries of efficiency and performance.

Collaborations:

Throughout his career, Tanaka has collaborated with esteemed individuals who share a passion for innovation. Notably, he has worked closely with Shunpei Yamazaki and Hidekazu Miyairi. Their collective expertise has resulted in groundbreaking advancements and intellectual contributions, further cementing Tanaka's position as a key figure in the industry.

Conclusion:

Koichiro Tanaka's expertise in laser irradiation methods and semiconductor device manufacturing has left an indelible mark on the industry. With a vast patent portfolio and numerous career highlights, Tanaka has consistently tackled challenges and proposed ingenious solutions. Through collaborations with esteemed colleagues, he continues to redefine the semiconductor landscape. As the industry evolves, Koichiro Tanaka's dedication to innovation remains unwavering, shaping the future of semiconductor devices.

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