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San Jose, CA, United States of America

Ultratech Stepper, Inc.

USPTO Granted Patents = 60

Trademarks = 5

Forward Citations = 2,759

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42 inventors (with patents filed for the assignee):

Somit Talwar (22 out of 34 patents)

David A Markle (20 out of 80 patents)

Andrew M Hawryluk (14 out of 64 patents)

4. Yun Yu Wang (12 out of 256 patents)

5. Hwan J Jeong (11 out of 34 patents)

6. Michael O Thompson (8 out of 30 patents)

7. Kurt H Weiner (5 out of 63 patents)

8. David G Stites (4 out of 9 patents)

9. Karl-Josef Kramer (4 out of 4 patents)

10. Gaurav Verma (3 out of 22 patents)

11. Yu Chue Fong (3 out of 3 patents)

12. Thomas H Newman (3 out of 3 patents)

13. Gerald John Alonzo (3 out of 9 patents)

14. Boris Grek (2 out of 19 patents)

15. Weijian Wang (2 out of 3 patents)

Core Competencies:

Magnetic Levitation Stage

Semiconductor Gate Doping

Lithography System

Laser Thermal Processing

Imaging Stabilization

Fiber-Optic Interferometer

Silicide Region Formation

Extreme Ultraviolet Lithography

Acousto-Optical Light Tunnel

Thermally Induced Reflectivity Switch

Motion Compensation

Radiant Energy Monitoring

60 patents: Sort by Forward Citations

1. 6777833 - Magnetic levitation stage apparatus and method (2004-08-17),

2. 6777317 - Method for semiconductor gate doping (2004-08-17),

3. 6753947 - Lithography system and method for device manufacture (2004-06-22),

4. 6747245 - Laser scanning apparatus and methods for thermal processing (2004-06-08),

5. 6731376 - System and method for reducing colinearity effects in manufacturing microdevices (2004-05-04),

6. 6680774 - Method and apparatus for mechanically masking a workpiece (2004-01-20),

7. 6671235 - Method of and apparatus for defining disk tracks in magnetic recording media (2003-12-30),

8. 6645838 - Selective absorption process for forming an activated doped region in a semiconductor (2003-11-11),

9. 6635588 - Method for laser thermal processing using thermally induced reflectivity switch (2003-10-21),

10. 6635541 - Method for annealing using partial absorber layer exposed to radiant energy and article made with partial absorber layer (2003-10-21),

11. 6617600 - Radiation shield device and method (2003-09-09),

12. 6617555 - Imaging stabilization apparatus and method for high-performance optical systems (2003-09-09),

13. 6570656 - Illumination fluence regulation system and method for use in thermal processing employed in the fabrication of reduced-dimension integrated circuits (2003-05-27),

14. 6556279 - Motion compensation system and method for lithography (2003-04-29),

15. 6554464 - Apparatus for and method of reducing or eliminating interference effects in a light tunnel illuminator (2003-04-29),

Ultratech Stepper, Inc. is a leading manufacturer of semiconductor lithography equipment. With a rich history of over 45 years, the company offers advanced solutions for the semiconductor industry, including photolithography systems, wafer inspection tools, and related software. Ultratech Stepper is committed to innovation, precision, and delivering cutting-edge technology to its global customer base. For more information about the company and its products, please visit their official website.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

60 Patents

#153 in San Jose, CA

#1,363 in California

#5,788 in US

#11,665 in the World

San Jose, CA, United States of America

Ultratech Stepper, Inc.

Forward Citations = 2,759

42 inventors:

Somit Talwar (22 out of 34 patents)

David A Markle (20 out of 80 patents)

Andrew M Hawryluk (14 out of 64 patents)

4. Yun Yu Wang (12 out of 256 patents)

5. Hwan J Jeong (11 out of 34 patents)

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