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San Jose, CA, United States of America

Ultratech Stepper, Inc.

Calculating rank

USPTO Granted Patents = 60

% Expired Patents = 5.0

Trademarks = 4

Forward Citations = 2,768

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42 inventors (with patents filed for the assignee):

Somit Talwar (22 out of 34 patents)

David A Markle (20 out of 81 patents)

Andrew M Hawryluk (14 out of 64 patents)

4. Yun Yu Wang (12 out of 257 patents)

5. Hwan J Jeong (11 out of 34 patents)

6. Michael O Thompson (8 out of 30 patents)

7. Kurt H Weiner (5 out of 63 patents)

8. David G Stites (4 out of 9 patents)

9. Karl-Josef Kramer (4 out of 4 patents)

10. Gaurav Verma (3 out of 22 patents)

11. Yu Chue Fong (3 out of 3 patents)

12. Thomas H Newman (3 out of 3 patents)

13. Gerald John Alonzo (3 out of 9 patents)

14. Boris Grek (2 out of 19 patents)

15. Weijian Wang (2 out of 3 patents)

Core Competencies:

Magnetic Levitation Stage

Laser Scanning Apparatus

Thermal Processing

Semiconductor Gate Doping

Imaging Stabilization

Microdevices Manufacturing

Selective Absorption Process

Optical Systems

Integrated Circuits

Field-Effect Transistors

Six Degrees of Freedom

Maskless Lithography

60 patents: Sort by Forward Citations

1. 6777833 - Magnetic levitation stage apparatus and method (2004-08-17),

2. 6777317 - Method for semiconductor gate doping (2004-08-17),

3. 6753947 - Lithography system and method for device manufacture (2004-06-22),

4. 6747245 - Laser scanning apparatus and methods for thermal processing (2004-06-08),

5. 6731376 - System and method for reducing colinearity effects in manufacturing microdevices (2004-05-04),

6. 6680774 - Method and apparatus for mechanically masking a workpiece (2004-01-20),

7. 6671235 - Method of and apparatus for defining disk tracks in magnetic recording media (2003-12-30),

8. 6645838 - Selective absorption process for forming an activated doped region in a semiconductor (2003-11-11),

9. 6635588 - Method for laser thermal processing using thermally induced reflectivity switch (2003-10-21),

10. 6635541 - Method for annealing using partial absorber layer exposed to radiant energy and article made with partial absorber layer (2003-10-21),

11. 6617600 - Radiation shield device and method (2003-09-09),

12. 6617555 - Imaging stabilization apparatus and method for high-performance optical systems (2003-09-09),

13. 6570656 - Illumination fluence regulation system and method for use in thermal processing employed in the fabrication of reduced-dimension integrated circuits (2003-05-27),

14. 6556279 - Motion compensation system and method for lithography (2003-04-29),

15. 6554464 - Apparatus for and method of reducing or eliminating interference effects in a light tunnel illuminator (2003-04-29),

Company Overview

Ultratech Stepper, Inc., based in San Jose, California, specializes in advanced lithography systems essential for semiconductor manufacturing. The company focuses on innovative technologies such as magnetic levitation stages and laser scanning apparatuses, which enhance precision in microdevice fabrication. Ultratech's expertise extends to thermal processing, semiconductor gate doping, and imaging stabilization, positioning it as a key player in the development of cutting-edge optical systems and selective absorption processes for the semiconductor industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

60 Patents

#168 in San Jose, CA

#1,405 in California

#5,999 in US

#12,094 in the World

San Jose, CA, United States of America

Ultratech Stepper, Inc.

Forward Citations = 2,768

42 inventors:

Somit Talwar (22 out of 34 patents)

David A Markle (20 out of 81 patents)

Andrew M Hawryluk (14 out of 64 patents)

4. Yun Yu Wang (12 out of 257 patents)

5. Hwan J Jeong (11 out of 34 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Ultratech Stepper, Inc.. Retrieved from https://idiyas.com/company/ultratech-stepper

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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