Gerald John Alonzo

Title: Gerald John Alonzo: Innovator in Substrate Processing Technologies

Introduction

Gerald John Alonzo is a notable inventor based in Los Gatos, California. He holds a total of nine patents, showcasing his significant contributions to the field of substrate processing technologies. His innovative work has advanced methods that enhance the efficiency and effectiveness of material removal processes.

Latest Patents

One of his latest patents is titled "Asymmetry correction via variable relative velocity of a wafer." This patent outlines techniques for removing material on a substrate by rotating it about a first axis in a first direction while urging its surface against a polishing pad. The method involves varying the rotation rates to achieve optimal results. Another significant patent is focused on "Methods for a web-based CMP system." This patent describes a substrate processing method that ensures consistent tensioning of a polishing article in a web-based polishing system, enhancing the overall performance of the polishing process.

Career Highlights

Throughout his career, Gerald has worked with prominent companies such as Applied Materials, Inc. and Ultratech Stepper, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in substrate processing.

Collaborations

Gerald has collaborated with notable professionals in his field, including David A Markle and Hwan J Jeong. These collaborations have contributed to the advancement of technologies in substrate processing.

Conclusion

Gerald John Alonzo's contributions to substrate processing technologies through his patents and career achievements highlight his role as an influential inventor. His innovative methods continue to impact the industry positively.