This inventor holds 34 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Digital Lithography. Top assignees: Ultratech Stepper, Inc., Applied Materials, Inc., Kla-Tencor Technologies Corporation. Active years: 1993-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
11 out of 60 
10 out of 14,454 
3 out of 641 
Years Active: 1993-2025
Areas of Expertise:
Title: Innovative Contributions of Hwan J Jeong in Digital Lithography
Introduction: Hwan J Jeong, an esteemed inventor based in Los Altos, California, holds an impressive portfolio of 32 patents. His innovative work primarily focuses on advancements in digital lithography systems, which are crucial for various applications in the semiconductor industry.
Latest Patents: Among his latest notable patents is a system for controlling light source wavelengths to achieve selectable phase shifts between pixels in digital lithography systems. This innovative solution allows adjustment of the light source wavelength to compensate for tilt errors in micromirrors while ensuring the reflected light remains perpendicular. The adjacent pixels can have their phase shifts determined by the optical path difference, providing significant precision in lithography applications. Another remarkable patent involves a system for creating accurate grating patterns using multiple writing columns, each capable of performing multiple scans. This lithography system utilizes a multi-column imaging system equipped on a bridge that moves in a cross-scan direction, allowing for meticulous pattern generation on substrates.
Career Highlights: Hwan J Jeong has garnered extensive experience in the field, having worked with two prominent companies: Ultratech Stepper, Inc. and Applied Materials, Inc. His contributions to these organizations have significantly advanced their technological capabilities in digital lithography.
Collaborations: Throughout his career, Hwan has collaborated with inspiring professionals, including colleagues David A Markle and Gerald John Alonzo. These collaborations have fostered an environment of innovation, further enhancing the quality and impact of their collective work in the industry.
Conclusion: Hwan J Jeong's remarkable contributions to digital lithography are evident through his numerous patents and collaborations. His innovative solutions are pivotal in advancing the semiconductor manufacturing process, showcasing his commitment to pushing the boundaries of technology. As the industry continues to evolve, Hwan's expertise and inventions will undoubtedly play a critical role in shaping its future.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile