The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Dec. 30, 2013
David A. Markle, Saratoga, CA (US);
Rudolf H. Hendel, Los Gatos, CA (US);
John S. Petersen, Austin, TX (US);
Hwan J. Jeong, Los Altos, CA (US);
David A. Markle, Saratoga, CA (US);
Rudolf H. Hendel, Los Gatos, CA (US);
John S. Petersen, Austin, TX (US);
Hwan J. Jeong, Los Altos, CA (US);
Periodic Structures Inc., Los Gatos, CA (US);
Abstract
Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.