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Nanometrics Inc.

USPTO Granted Patents = 153

CIPO Patents = 9

EPO Patents = 15

Trademarks = 13

Forward Citations = 2,724

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130 inventors (with patents filed for the assignee):

Jaime Poris (15 out of 20 patents)

Roger R Lowe-Webb (13 out of 13 patents)

Pablo I Rovira (11 out of 11 patents)

4. Richard A Yarussi (11 out of 11 patents)

5. John D Heaton (11 out of 11 patents)

6. Zhuan Liu (10 out of 10 patents)

7. Blaine R Spady (10 out of 10 patents)

8. Weidong Yang (9 out of 11 patents)

9. Vincent J Coates (9 out of 9 patents)

10. Ye Feng (8 out of 18 patents)

11. William A McGahan (8 out of 8 patents)

12. Nigel Peter Smith (8 out of 13 patents)

13. Pedro Vagos (7 out of 10 patents)

14. Amit Shachaf (6 out of 12 patents)

15. Silvio J Rabello (6 out of 6 patents)

Core Competencies:

Optical Metrology

Surface Topography

Spectroscopic Metrology

Overlay Measurement

Diffraction Based Overlay

Thin Films Measurement

Capacitive Displacement Transducer

Mueller Matrix Spectroscopy

Scatterometry Measurement

3D Target Characterization

Electrical Characterization

Pattern Recognition

153 patents: Sort by Forward Citations

1. 10488184 - Interferometric characterization of surface topography (2019-11-26),

2. 10451542 - Local purge within metrology and inspection systems (2019-10-22),

3. 10296554 - Correction of angular error of plane-of-incidence azimuth of optical metrology device (2019-05-21),

4. 10288408 - Scanning white-light interferometry system for characterization of patterned semiconductor features (2019-05-14),

5. 10274367 - Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device (2019-04-30),

6. 10254110 - Via characterization for BCD and depth metrology (2019-04-09),

7. 10107621 - Image based overlay measurement with finite gratings (2018-10-23),

8. 10082461 - Optical metrology with purged reference chip (2018-09-25),

9. 10061210 - 3D target for monitoring multiple patterning process (2018-08-28),

10. 9995689 - Optical metrology using differential fitting (2018-06-12),

11. 9958673 - Protected lens cover plate for an optical metrology device (2018-05-01),

12. 9958327 - Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device (2018-05-01),

13. 9903806 - Focusing system with filter for open or closed loop control (2018-02-27),

14. 9846122 - Optical metrology system for spectral imaging of a sample (2017-12-19),

15. 9824176 - Optical critical dimension target design (2017-11-21),

Nanometrics Inc. is a leading provider of advanced process control systems and solutions for the semiconductor and related microelectronics industries. With a focus on accuracy, reliability, and innovation, Nanometrics enables customers to optimize their manufacturing processes and improve yield. The company offers a comprehensive portfolio of measurement and inspection systems that provide critical information for process control and optimization throughout the entire semiconductor fabrication process.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 16 2025

153 Patents

#3 in Kanata

#80 in Canada

#5,194 in the World

Nanometrics Inc.

Forward Citations = 2,724

130 inventors:

Jaime Poris (15 out of 20 patents)

Roger R Lowe-Webb (13 out of 13 patents)

Pablo I Rovira (11 out of 11 patents)

4. Richard A Yarussi (11 out of 11 patents)

5. John D Heaton (11 out of 11 patents)

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