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For the Inventor, By the Inventor

Milpitas, CA, United States of America

Nanometrics Inc.


USPTO Granted Patents = 153

% Expired Patents = 23.5



Trademarks = 13

Forward Citations = 2,788

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130 inventors (with patents filed for the assignee):

goldMedal Jaime Poris (15 out of 20 patents)

silverMedal Roger R Lowe-Webb (13 out of 13 patents)

bronzeMedal Pablo I Rovira (11 out of 11 patents)

4.  Richard A Yarussi (11 out of 11 patents)

5.  John D Heaton (11 out of 11 patents)

6.  Zhuan Liu (10 out of 10 patents)

7.  Blaine R Spady (10 out of 10 patents)

8.  Weidong Yang (9 out of 11 patents)

9.  Vincent J Coates (9 out of 9 patents)

10.  Ye Feng (8 out of 18 patents)

11.  William A McGahan (8 out of 8 patents)

12.  Nigel Peter Smith (8 out of 13 patents)

13.  Pedro Vagos (7 out of 10 patents)

14.  Amit Shachaf (6 out of 14 patents)

15.  Silvio J Rabello (6 out of 6 patents)


Core Competencies:
Surface Topography
Overlay Measurement
Spectral Imaging
Diffraction Based Overlay
Scatterometry
Thin-Film Measurement
Electrical Characterization
Seismic Sensor
Capacitive Displacement
Image-Based Measurement
Optical Critical Dimension
Local Process Variation

153 patents:

1. 10488184 - Interferometric characterization of surface topography (2019-11-26),
2. 10451542 - Local purge within metrology and inspection systems (2019-10-22),
3. 10296554 - Correction of angular error of plane-of-incidence azimuth of optical metrology device (2019-05-21),
4. 10288408 - Scanning white-light interferometry system for characterization of patterned semiconductor features (2019-05-14),
5. 10274367 - Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device (2019-04-30),
6. 10254110 - Via characterization for BCD and depth metrology (2019-04-09),
7. 10107621 - Image based overlay measurement with finite gratings (2018-10-23),
8. 10082461 - Optical metrology with purged reference chip (2018-09-25),
9. 10061210 - 3D target for monitoring multiple patterning process (2018-08-28),
10. 9995689 - Optical metrology using differential fitting (2018-06-12),
11. 9958673 - Protected lens cover plate for an optical metrology device (2018-05-01),
12. 9958327 - Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device (2018-05-01),
13. 9903806 - Focusing system with filter for open or closed loop control (2018-02-27),
14. 9846122 - Optical metrology system for spectral imaging of a sample (2017-12-19),
15. 9824176 - Optical critical dimension target design (2017-11-21),
Nanometrics Inc. is a leading provider of advanced process control systems and solutions for the semiconductor and related microelectronics industries. With a focus on accuracy, reliability, and innovation, Nanometrics enables customers to optimize their manufacturing processes and improve yield. The company offers a comprehensive portfolio of measurement and inspection systems that provide critical information for process control and optimization throughout the entire semiconductor fabrication process.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Sep 22 2026

Nanometrics Inc.
153 Patents

#23 in Milpitas, CA

#568 in California

#2,575 in US

#5,322 in the World

Milpitas, CA (US)
Milpitas, CA, United States of America

Nanometrics Inc.

Forward Citations = 2,788

130 inventors:

goldMedal Jaime Poris (15 out of 20 patents)

silverMedal Roger R Lowe-Webb (13 out of 13 patents)

bronzeMedal Pablo I Rovira (11 out of 11 patents)

4.  Richard A Yarussi (11 out of 11 patents)

5.  John D Heaton (11 out of 11 patents)

Please report any incorrect information to [email protected]
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