For the Inventor, By the Inventor

Enter assignee name

Milpitas, CA, United States of America

Nanometrics Inc.

USPTO Granted Patents = 153

% Expired Patents = 23.5

CIPO Patents = 9

EPO Patents = 15

Trademarks = 13

Forward Citations = 2,788

Loading Chart...

Loading Chart...

130 inventors (with patents filed for the assignee):

Jaime Poris (15 out of 20 patents)

Roger R Lowe-Webb (13 out of 13 patents)

Pablo I Rovira (11 out of 11 patents)

4. Richard A Yarussi (11 out of 11 patents)

5. John D Heaton (11 out of 11 patents)

6. Zhuan Liu (10 out of 10 patents)

7. Blaine R Spady (10 out of 10 patents)

8. Weidong Yang (9 out of 11 patents)

9. Vincent J Coates (9 out of 9 patents)

10. Ye Feng (8 out of 18 patents)

11. William A McGahan (8 out of 8 patents)

12. Nigel Peter Smith (8 out of 13 patents)

13. Pedro Vagos (7 out of 10 patents)

14. Amit Shachaf (6 out of 14 patents)

15. Silvio J Rabello (6 out of 6 patents)

Core Competencies:

Surface Topography

Overlay Measurement

Spectral Imaging

Diffraction Based Overlay

Scatterometry

Thin-Film Measurement

Electrical Characterization

Seismic Sensor

Capacitive Displacement

Image-Based Measurement

Optical Critical Dimension

Local Process Variation

153 patents: Sort by Forward Citations

1. 10488184 - Interferometric characterization of surface topography (2019-11-26),

2. 10451542 - Local purge within metrology and inspection systems (2019-10-22),

3. 10296554 - Correction of angular error of plane-of-incidence azimuth of optical metrology device (2019-05-21),

4. 10288408 - Scanning white-light interferometry system for characterization of patterned semiconductor features (2019-05-14),

5. 10274367 - Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device (2019-04-30),

6. 10254110 - Via characterization for BCD and depth metrology (2019-04-09),

7. 10107621 - Image based overlay measurement with finite gratings (2018-10-23),

8. 10082461 - Optical metrology with purged reference chip (2018-09-25),

9. 10061210 - 3D target for monitoring multiple patterning process (2018-08-28),

10. 9995689 - Optical metrology using differential fitting (2018-06-12),

11. 9958673 - Protected lens cover plate for an optical metrology device (2018-05-01),

12. 9958327 - Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device (2018-05-01),

13. 9903806 - Focusing system with filter for open or closed loop control (2018-02-27),

14. 9846122 - Optical metrology system for spectral imaging of a sample (2017-12-19),

15. 9824176 - Optical critical dimension target design (2017-11-21),

Company Overview

Nanometrics Inc., based in Milpitas, California, specializes in optical metrology solutions that enhance the manufacturing processes of advanced semiconductor devices. The company focuses on critical measurement technologies, including surface topography, overlay measurement, and thin-film measurement, which are essential for ensuring precision in semiconductor fabrication. Additionally, Nanometrics develops advanced spectral imaging and electrical characterization tools, contributing to innovations in various high-tech industries, including electronics and seismic sensing.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

153 Patents

#23 in Milpitas, CA

#571 in California

#2,583 in US

#5,338 in the World

Milpitas, CA, United States of America

Nanometrics Inc.

Forward Citations = 2,788

130 inventors:

Jaime Poris (15 out of 20 patents)

Roger R Lowe-Webb (13 out of 13 patents)

Pablo I Rovira (11 out of 11 patents)

4. Richard A Yarussi (11 out of 11 patents)

5. John D Heaton (11 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Nanometrics Inc.. Retrieved from https://idiyas.com/company/nanometrics

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

Loading…