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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Roger R Lowe-Webb

USPTO Granted Patents = 13

Average Co-Inventor Count = 2.8

ph-index = 12

Forward Citations = 598(Granted Patents)


Location History:

  • Mountain View, CA (US) (2003 - 2008)
  • Sunnyvale, CA (US) (2005 - 2009)

Company Filing History:

goldMedal13 out of 153 
 
Nanometrics Inc.
 patents

Years Active: 2003-2009

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13 patents (USPTO):Explore Patents
1. 7508976 - Local process variation correction for overlay measurement (2009-03-24),
2. 7372565 - Spectrometer measurement of diffracting structures (2008-05-13),
3. 7236244 - Alignment target to be measured with multiple polarization states (2007-06-26),
4. 7230705 - Alignment target with designed in offset (2007-06-12),
5. 7115858 - Apparatus and method for the measurement of diffracting structures (2006-10-03),
6. 7061615 - Spectroscopically measured overlay target (2006-06-13),
7. 7046361 - Positioning two elements using an alignment target with a designed offset (2006-05-16),
8. 6992764 - Measuring an alignment target with a single polarization state (2006-01-31),
9. 6982793 - Method and apparatus for using an alignment target with designed in offset (2006-01-03),
10. 6970255 - Encoder measurement based on layer thickness (2005-11-29),
11. 6958819 - Encoder with an alignment target (2005-10-25),
12. 6949462 - Measuring an alignment target with multiple polarization states (2005-09-27),
13. 6522406 - Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizer (2003-02-18),

Title: **The Innovations of Roger R. Lowe-Webb: Pioneering Diffraction-Based Metrology**

Introduction

Roger R. Lowe-Webb, an esteemed inventor based in Sunnyvale, CA, has made significant contributions to the field of metrology with a remarkable portfolio of 13 patents. His inventive spirit and innovative technologies have propelled advancements in overlay measurement and diffraction analysis.

Latest Patents

Among his latest patents, Lowe-Webb has developed a groundbreaking method entitled "Local process variation correction for overlay measurement." This invention utilizes a diffraction-based overlay metrology system that effectively isolates overlay errors from local process variations. By measuring the overlay pattern both before and after the formation of top diffraction gratings, he is able to refine overlay error calculations. In another embodiment, his techniques can remove local process variations without the need for pre-measurements by intricately designing overlay patterns.

Another notable patent is the "Spectrometer measurement of diffracting structures," which introduces a normal incidence reflectometer equipped with a rotatable analyzer/polarizer. This innovation allows for the measurement of diffracted radiation at multiple orientations, further enhancing the accuracy of measurements regardless of the incident light's polarization orientation.

Career Highlights

Lowe-Webb currently contributes his expertise at Nanometrics Inc., a leader in advanced metrology solutions. His work at the company is marked by a commitment to pushing the boundaries of measurement technology, essential for modern semiconductor manufacturing.

Collaborations

Throughout his career, Lowe-Webb has collaborated with notable colleagues, including Weidong Yang and John D. Heaton. Their combined efforts have fostered a dynamic environment of innovation and have led to the successful development of cutting-edge technologies in metrology.

Conclusion

Roger R. Lowe-Webb's exceptional contributions to the field of metrology underscore his role as a significant inventor. With his ongoing innovations and collaborative spirit, he continues to influence the landscape of technology, ensuring enhanced accuracy and efficiency in overlay measurement and diffraction analysis.

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